公开(公告)号：US06962766B2

公开(公告)日：2005-11-08

申请号：US10109872

申请日：2002-04-01

申请人： Kazuya Uenishi ,  Toshiaki Aoai ,  Kenichiro Sato

发明人： Kazuya Uenishi ,  Toshiaki Aoai ,  Kenichiro Sato

IPC分类号： C08K5/00 ,  C08L101/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/0045 ,  G03F7/0397

摘要： A positive photoresist composition comprises: an acid-decomposable resin containing a specified repeating unit; an acid-generator; and a specified dissolution-inhibiting compound.

摘要翻译： 正性光致抗蚀剂组合物包含：含有特定重复单元的酸分解树脂; 酸发生器; 和特定的溶解抑制化合物。

公开(公告)号：US5981140A

公开(公告)日：1999-11-09

申请号：US932168

申请日：1997-09-17

申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/121 ,  Y10S430/122

摘要： A positive photosensitive composition comprising:a compound represented by formula (I) or (I') and a compound represented by formula (II) as compounds which generate a sulfonic acid upon irradiation with actinic rays or radiation: ##STR1## The substituents in these formulae are as defined in the specification. The positive photosensitive composition has high sensitivity and high resolving power, undergoes neither a decrease in resist pattern line width nor the formation of a T-top resist pattern surface with the lapse of time from exposure to heat treatment, and exhibits less profile deterioration such as residual standing wave and collapse.

摘要翻译： 一种正型光敏组合物，其包含：由式（I）或（I'）表示的化合物和由式（II）表示的化合物作为在光化射线或辐射照射时产生磺酸的化合物：这些式中的取代基为 在规范中定义。 正型感光性组合物具有高灵敏度和高分辨能力，经历曝光与热处理后的时间不会影响抗蚀剂图案线宽度的降低和T型抗蚀剂图形表面的形成，并且表现出较小的轮廓劣化，例如 残余驻波和崩溃。

公开(公告)号：US5529881A

公开(公告)日：1996-06-25

申请号：US404985

申请日：1995-03-16

申请人： Yasumasa Kawabe ,  Kenichiro Sato ,  Toshiaki Aoai ,  Kazuya Uenishi

发明人： Yasumasa Kawabe ,  Kenichiro Sato ,  Toshiaki Aoai ,  Kazuya Uenishi

IPC分类号： G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/022

摘要： A positive photoresist composition for super fine working is disclosed, which comprises (a) an alkali-soluble resin and (b) as a photosensitive compound the 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic acid ester of a polyhydroxy compound represented by formula (I) or (II), wherein in a high-speed liquid chromatography measured using a ultraviolet ray of 254 nm, the pattern of the diester component and the pattern of the complete ester component of said 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic acid of the polyhydroxy compound shown by formula (I) or (II) are at least 50% and less than 40%, respectively, of the whole pattern areas; ##STR1## wherein R.sub.1 to R.sub.11, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, or a cycloalkyl group, with the proviso that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group, and R.sub.12 to R.sub.22, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, or a cycloalkyl group, with the proviso that at least one of R.sub.12 to R.sub.22 is a cycloalkyl group. The photoresist composition has a high resolving power and a less layer thickness reliance of the resolving power, and a wide development latitude, is reluctant to form a development residue, and further has a very excellent storage stability, and does not deposit the photosensitive material and does not form microgels with the passage of time.

摘要翻译： 公开了一种用于超细加工的正性光致抗蚀剂组合物，其包含（a）碱溶性树脂和（b）作为光敏化合物的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯 由式（I）或（II）表示的多羟基化合物，其中在使用254nm的紫外线测量的高速液相色谱中，所述二酯组分的图案和所述1,2的完全酯组分的图案 式（I）或（II）所示的多羟基化合物的萘醌二叠氮基-5-（和/或-4-）磺酸分别为整个图案区域的至少50％且小于40％; 1， 其可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基或环烷基，条件是R 1至R 11中的至少一个为环烷基，R 12至 R 22可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基，o 环烷基，条件是R12至R22中的至少一个为环烷基。 光致抗蚀剂组合物具有高的分辨能力和较小的层厚度的分辨能力依赖性，并且广泛的开发范围不愿形成显影残留物，并且还具有非常优异的储存稳定性，并且不沉积感光材料和 随着时间的推移不会形成微凝胶。

公开(公告)号：US6150068A

公开(公告)日：2000-11-21

申请号：US911165

申请日：1997-08-14

申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  H01L21/027 ,  B03F7/004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/121

摘要： A photosensitive resin composition for far-ultraviolet exposure of from 170 to 220 nm, which comprises an N-hydroxymaleinimide-type sulfonate photo acid generator having a specific structure and a resin having a substituent capable of increasing the solubility to an alkali developer by an acid, and a pattern forming method using the photosensitive resin composition. The photosensitive resin composition has a high transparency to light having a wavelength of from 170 to 220 nm and is excellent in the photocomposition property and the acid generating efficiency.

摘要翻译： 一种用于远紫外线暴露于170至220nm的感光树脂组合物，其包含具有特定结构的N-羟基马来酰亚胺型磺酸盐光致酸产生剂和具有能够通过酸增加对碱性显影剂的溶解度的取代基的树脂 ，以及使用感光性树脂组合物的图案形成方法。 感光性树脂组合物对波长为170〜220nm的光具有高透明性，并且光致变色性和酸产生效率优异。

公开(公告)号：US06670095B2

公开(公告)日：2003-12-30

申请号：US10022363

申请日：2001-12-20

申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.

公开(公告)号：US06632586B1

公开(公告)日：2003-10-14

申请号：US09392588

申请日：1999-09-09

申请人： Toshiaki Aoai ,  Kenichiro Sato

发明人： Toshiaki Aoai ,  Kenichiro Sato

IPC分类号： G03C172

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):

摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B）通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，并且包含重复 由式（I）和（V）表示的单元：

公开(公告)号：US06479209B1

公开(公告)日：2002-11-12

申请号：US09075246

申请日：1998-05-11

申请人： Toshiaki Aoai ,  Kenichiro Sato ,  Morio Yagihara

发明人： Toshiaki Aoai ,  Kenichiro Sato ,  Morio Yagihara

IPC分类号： G03C173

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： Disclosed is a positive photosensitive composition capable of giving good sensitivity, resolution and resist pattern and exhibiting sufficiently high dry etching resistance on use of an exposure light source of 250 nm or less, particularly 220 nm or less, which composition comprises (A) a compound generating an acid on irradiation of an active light ray or radiation and (B) a resin having (i) at least one polycyclic-type alicyclic group, (ii) at least one ester group which decomposes by the action of an acid and increases the solubility in an alkali developer and (iii) at least one acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer, or comprises (A) a compound generating an acid on irradiation of an active light ray or radiation, (C) a resin having a polycyclic-type alicyclic group and an ester group which decomposes by the action of an acid and increases the solubility in an alkali developer, and (D) a resin having a polycyclic-type alicyclic group and an acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer.

摘要翻译： 公开了一种能够提供良好的灵敏度，分辨率和抗蚀剂图案并且在使用250nm或更小，特别是220nm或更小的曝光光源时表现出足够高的耐干蚀刻性的正性光敏组合物，该组合物包含（A）化合物 在活性光线或辐射照射时产生酸，和（B）具有（i）至少一种多环式脂环族基团的树脂，（ii）至少一种通过酸的作用分解并增加酸的酯基 在碱性显影剂中的溶解度和（iii）至少一种通过酸的作用分解并提高其在碱性显影剂中的溶解度的缩醛基，或包含（A）在活性光线或辐射照射时产生酸的化合物 ，（C）具有多环型脂环族基团和酯基的树脂，其通过酸的作用而分解并增加在碱性显影剂中的溶解度，（D）具有多环基的树脂 ype脂环族基团和通过酸的作用而分解并增加在碱性显影剂中的溶解度的缩醛基。

公开(公告)号：US06416925B1

公开(公告)日：2002-07-09

申请号：US09497281

申请日：2000-02-02

申请人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

发明人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

IPC分类号： G03C173

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

摘要翻译： 适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团 的酸以增加在碱性显影剂中的溶解度。

公开(公告)号：US06245485B1

公开(公告)日：2001-06-12

申请号：US09075818

申请日：1998-05-12

申请人： Toshiaki Aoai ,  Shunichi Kondo ,  Tsuguo Yamaoka ,  Kenichiro Sato

发明人： Toshiaki Aoai ,  Shunichi Kondo ,  Tsuguo Yamaoka ,  Kenichiro Sato

IPC分类号： G03C173

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/107 ,  Y10S430/111

摘要： Disclosed is a positive resist composition which ensures, on use of an exposure light source of 220 nm or less, high sensitivity, good resolution, sufficiently high resistance against dry etching, satisfactory adhesion to the substrate, and superior developability even with a developer conventionally used for resists (for example, a 2.38% aqueous tetramethylammonium hydroxide solution), the positive resist composition comprising a compound generating an acid on irradiation of an active light ray or radiation, a resin having a polycyclic-type alicyclic group and a carboxyl group, and a compound having at least two groups having a specific structure.

摘要翻译： 公开了一种正型抗蚀剂组合物，其使用220nm或更小的曝光光源，高灵敏度，高分辨率，足够高的抗干蚀刻性，对基材的良好粘附性以及即使使用常规使用的显影剂也具有优异的显影性 对于抗蚀剂（例如，2.38％的四甲基氢氧化铵水溶液），正型抗蚀剂组合物包含在活性光线或辐射的照射下产生酸的化合物，具有多环型脂环族基团和羧基的树脂，以及 具有至少两个具有特定结构的基团的化合物。

公开(公告)号：US5523396A

公开(公告)日：1996-06-04

申请号：US531861

申请日：1995-09-21

申请人： Kenichiro Sato ,  Yasumasa Kawabe ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Yasumasa Kawabe ,  Toshiaki Aoai

IPC分类号： B01J31/02 ,  C07C303/28 ,  C07C309/47 ,  C07C309/69 ,  C07C309/71 ,  C07C309/76 ,  G03F7/022 ,  H01L21/027 ,  G03F7/023

CPC分类号： C07C303/28 ,  G03F7/022 ,  C07C2101/14

摘要： A process for synthesizing a quinonediazide ester is disclosed in which the esterification reaction of a polyhydroxy compound with 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonyl chloride is carried out in the presence of a base catalyst comprising a basic compound represented by formula (I) or (II): ##STR1## wherein R.sub.1 to R.sub.15 are defined in the disclosure. A positive working photoresist containing the ester is also disclosed. The process is capable of highly selectively yielding the desired photosensitive material containing specific unreacted hydroxyl group(s). The photoresist has high resolving power with reduced film thickness dependence of the resolving power, is less apt to leave a development residue, and has excellent storage stability for prolonged period of time.

摘要翻译： 公开了一种用于合成醌二叠氮化物酯的方法，其中多羟基化合物与1,2-萘醌二叠氮化物-5-（和/或-4-）磺酰氯的酯化反应在含有碱 式（I）或（II）表示的化合物：其中R 1至R 15在本公开内容中定义。 还公开了含有酯的正性工作光致抗蚀剂。 该方法能够高选择性地产生含有特定未反应羟基的所需光敏材料。 光致抗蚀剂具有高的分辨能力，降低膜分离能力的依赖性，更不容易留下显影残留物，并且在长时间内具有优异的储存稳定性。