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    Processes for pattern formation using photosensitive compositions and liquid development
    2.
    发明授权
    Processes for pattern formation using photosensitive compositions and liquid development 失效
    使用光敏组合物和液体显影的图案形成方法

    公开(公告)号：US5650259A

    公开(公告)日：1997-07-22

    申请号：US553978

    申请日：1995-11-06

    申请人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

    发明人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40

    CPC分类号： G03F7/0045 ,  G03F7/027

    摘要： A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxy group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with am actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.

    摘要翻译： 作为必要成分的感光性组合物：（A）具有羧基和羟基苯基的聚合物，或（A'）具有羧基的聚合物和（A“）具有 羟基苯基，（B）分子中具有至少两个乙烯基醚基的化合物，（C）当用光激光照射时产生酸的化合物，并且可用作具有高分子量的正型光致抗蚀剂 精细图像图案的分辨率和优异的成形性，印刷材料等; 以及使用所述组合物的图案形成方法。

    Light-sensitive composition
    3.
    发明授权
    Light-sensitive composition 失效
    感光组合物

    公开(公告)号：US5364738A

    公开(公告)日：1994-11-15

    申请号：US957034

    申请日：1992-10-06

    申请人： Shunichi Kondo ,  Akira Umehara ,  Yoshimasa Aotani ,  Tsuguo Yamaoka

    发明人： Shunichi Kondo ,  Akira Umehara ,  Yoshimasa Aotani ,  Tsuguo Yamaoka

    IPC分类号： G03F7/004 ,  G03F7/016 ,  G03C1/56 ,  C08F2/46 ,  G03C1/72 ,  G03C1/73

    CPC分类号： G03F7/016 ,  G03F7/0045 ,  Y10S430/122

    摘要： A positive-working light-sensitive composition whose solubility in a developer is increased by irradiation of light, which comprises:(a) a vinyl ether compound having at least one group represented by the following formula (A); ##STR1## wherein R.sup.3 represents a linear or branched alkylene group having 1 to 10 carbon atoms and n represents an integer of 0 or 1;(b) a compound capable of being decomposed by irradiation of an actinic light ray or a radiant ray and releasing an acid; and(c) an alkali-soluble polymer, the light-sensitive composition having high sensitivity to light and permitting the use of light of a wide wavelength range.

    摘要翻译： 一种正性工作的感光性组合物，其在显影剂中的溶解度通过光照射而增加，其包括：（a）具有至少一个由下式（A）表示的基团的乙烯基醚化合物; （A）其中R 3表示具有1至10个碳原子的直链或支链亚烷基，n表示0或1的整数; （b）能够通过照射光化射线或辐射线而分解并释放酸的化合物; 和（c）碱溶性聚合物，所述感光组合物对光具有高灵敏度并允许使用宽波长范围的光。

    Photopolymerizable composition
    4.
    发明授权
    Photopolymerizable composition 失效
    可光聚合组合物

    公开(公告)号：US5250385A

    公开(公告)日：1993-10-05

    申请号：US752783

    申请日：1991-08-30

    申请人： Syunichi Kondo ,  Yoshimasa Aotani ,  Akira Umehara ,  Tsuguo Yamaoka

    发明人： Syunichi Kondo ,  Yoshimasa Aotani ,  Akira Umehara ,  Tsuguo Yamaoka

    IPC分类号： G03F7/027 ,  G03F7/028 ,  G03F7/029 ,  G03F7/008

    CPC分类号： G03F7/029

    摘要： A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.

    摘要翻译： 可光聚合组合物包含具有至少两个末端亚乙基的光聚合性烯属不饱和化合物，光聚合引发剂和有机聚合物粘合剂，其中光聚合引发剂是鎓化合物的芳族磺酸盐。 该组合物对从紫外线到可见光区域的宽波长范围内的光化射线具有高灵敏度，因此可用于制备平版印刷版，树脂凸版，用于制造印刷电路板的抗蚀剂或光掩模，单色 和用于转印或显色的着色片和彩色显影片。

    Photosensitive material
    6.
    发明授权
    Photosensitive material 失效
    感光材料

    公开(公告)号：US4424325A

    公开(公告)日：1984-01-03

    申请号：US265571

    申请日：1981-05-20

    申请人： Takahiro Tsunoda ,  Tsuguo Yamaoka ,  Sinji Tamura

    发明人： Takahiro Tsunoda ,  Tsuguo Yamaoka ,  Sinji Tamura

    IPC分类号： C08F20/00 ,  C08F20/22 ,  C08F220/24 ,  G03F7/012 ,  G03F7/038 ,  C08F214/18

    CPC分类号： C08F220/24 ,  G03F7/012 ,  G03F7/038 ,  G03F7/0388 ,  Y10S522/904

    摘要： A copolymer comprising (a) a monomer having a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or .alpha.,.beta.-unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.

    摘要翻译： 一种共聚物，其包含（a）在分子的一端具有C7-C21全氟烷基或全氟链烯基的单体和分子另一端的烯键式不饱和基团，和（b）具有感光性基团的单体。 叠氮苯甲酰氧基，肉桂酰氧基，苯甲酰基苯基或α，β-不饱和酮基。 该共聚物具有优异的光敏性和优异的拒水拒油性能，并且可用于各种目的，例如， 作为干胶版印刷版或抗蚀剂的感光材料，作为可光固化的防油斥油涂料。

    Process for producing ether compound
    7.
    发明授权
    Process for producing ether compound 失效
    生产醚化合物的方法

    公开(公告)号：US07358030B2

    公开(公告)日：2008-04-15

    申请号：US11289706

    申请日：2005-11-30

    申请人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    发明人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0392 ,  C07C67/04 ,  C07C69/54

    摘要： The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

    摘要翻译： 本发明提供以下制备醚化合物的方法，其可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少的副反应和高产率。 制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是 并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基 ，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2， 和R 3分别具有与上述相同的含义。

    Composition sensitive to visible light
    8.
    发明授权
    Composition sensitive to visible light 失效
    组合对可见光敏感

    公开(公告)号：US07294448B2

    公开(公告)日：2007-11-13

    申请号：US10523523

    申请日：2003-08-20

    申请人： Tsuguo Yamaoka ,  Katsuhiro Ito ,  Takeshi Iwasaki ,  Ikuo Shimizu

    发明人： Tsuguo Yamaoka ,  Katsuhiro Ito ,  Takeshi Iwasaki ,  Ikuo Shimizu

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0392

    摘要： The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.

    摘要翻译： 本发明提供对可见光高度敏感的可见光敏组合物，可用作电子电路形成材料，平版印刷材料等，所述可见光敏组合物包含（a）包含 由通式（I）表示的重复单元：其中R 1，R 2，R 3和R 3相同或不同，各自表示取代的 或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或者R 1和R 2与邻接的碳原子一起形成环烷基， 4表示低级烷基，（b）通过可见光照射产生酸的化合物和（c）敏化染料。

    Process for producing ether compound
    9.
    发明申请
    Process for producing ether compound 失效
    生产醚化合物的方法

    公开(公告)号：US20060074262A1

    公开(公告)日：2006-04-06

    申请号：US11289706

    申请日：2005-11-30

    申请人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    发明人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    IPC分类号： C07C43/30

    CPC分类号： G03F7/0392 ,  C07C67/04 ,  C07C69/54

    摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.

    摘要翻译： 本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物 产量。 制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是 并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基 ，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2， 和R 3分别具有与上述相同的含义。

    Process for producing ether compound
    10.
    发明授权
    Process for producing ether compound 失效
    生产醚化合物的方法

    公开(公告)号：US07015363B2

    公开(公告)日：2006-03-21

    申请号：US10482111

    申请日：2002-07-12

    申请人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    发明人： Ikuo Shimizu ,  Katsuhiro Ito ,  Kazuyasu Osada ,  Tsuguo Yamaoka

    IPC分类号： C07C41/54

    CPC分类号： G03F7/0392 ,  C07C67/04 ,  C07C69/54

    摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

    摘要翻译： 本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物 产量。 制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是 并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基 ，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2， 和R 3分别具有与上述相同的含义。