公开(公告)号：US06639652B1

公开(公告)日：2003-10-28

申请号：US09587907

申请日：2000-06-06

申请人： Kenichiro Mori ,  Kazuhiro Takahashi

发明人： Kenichiro Mori ,  Kazuhiro Takahashi

IPC分类号： G03B2754

CPC分类号： G03F7/70175

摘要： An illumination system includes an optical system, an optical integrator and a condenser. The optical system collects light from a light source and includes a mirror for reflecting the light. The mirror has an ellipsoidal reflection surface of a shape being out of axial symmetry for defining an aperture of rectangular or semicircular shape as seen in an optical axis direction. The optical integrator produces plural light beams by use of light from the optical system and includes an array of condensing elements having a light entrance surface of rectangular shape as seen in the optical axis direction. A lengthwise direction of the rectangular-shaped or semicircular-shaped aperture of the ellipsoidal reflection surface corresponds to a lengthwise direction of the rectangular-shape light entrance surface of the condensing elements. The condenser illuminates a surface to be illuminated by use of the plural light beams.

摘要翻译： 照明系统包括光学系统，光学积分器和冷凝器。 光学系统从光源收集光并且包括用于反射光的反射镜。 反射镜具有椭圆形的反射表面，其形状不在轴向对称状态，用于限定在光轴方向上看到的矩形或半圆形的孔。 光学积分器通过使用来自光学系统的光产生多个光束，并且包括具有在光轴方向上看到的矩形形状的光入射表面的聚光元件阵列。 椭圆面反射面的矩形或半圆形孔的长度方向对应于聚光元件的矩形光入射面的长度方向。 聚光器通过使用多个光束照亮要照明的表面。

公开(公告)号：US20090086185A1

公开(公告)日：2009-04-02

申请号：US12239059

申请日：2008-09-26

申请人： Kenichiro Mori

发明人： Kenichiro Mori

IPC分类号： G03B27/72

CPC分类号： G03F7/70091 ,  G03F7/70566

摘要： An illumination optical system comprises a first polarization control unit which is located between a light source and a pupil of an illumination optical system, and a second polarization control unit which is located between the first polarization control unit and the pupil, wherein a region on the pupil includes a plurality of partial regions which are classified into a first group including a partial region having a largest area, and a second group including a partial region different from the partial region having the largest area, and the second polarization control unit controls a polarization state in the partial region which belongs to only the second group.

摘要翻译： 照明光学系统包括位于照明光学系统的光源和光瞳之间的第一偏振控制单元和位于第一偏振控制单元和瞳孔之间的第二偏振控制单元，其中， 瞳孔包括分为包括具有最大面积的部分区域的第一组的多个部分区域和包括与具有最大面积的部分区域不同的部分区域的第二组，并且第二偏振控制单元控制偏振 在仅属于第二组的部分区域中的状态。

公开(公告)号：US20050024619A1

公开(公告)日：2005-02-03

申请号：US10851851

申请日：2004-05-21

申请人： Kenichiro Shinoda ,  Kenichiro Mori

发明人： Kenichiro Shinoda ,  Kenichiro Mori

IPC分类号： G03B9/02 ,  G03B27/72 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70358 ,  G03B27/72 ,  G03F7/70066

摘要： An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.

摘要翻译： 曝光装置包括使用来自光源的光照射标线片的照明光学系统，用于将掩模版图案投影到基板上的投影光学系统，以及具有用于调节基板上的照明区域的开口的可变挡块， 所述可变挡块设置在与所述基板共轭的位置附近，其中所述可变挡块的位置沿着所述照明光学系统的光轴或所述投影光学系统的光轴是可变的。

公开(公告)号：US5379347A

公开(公告)日：1995-01-03

申请号：US988420

申请日：1992-12-09

申请人： Norihide Kato ,  Tomohide Shimizu ,  Kenichiro Mori

发明人： Norihide Kato ,  Tomohide Shimizu ,  Kenichiro Mori

IPC分类号： G01N21/95 ,  G06T7/00 ,  G06K9/20

CPC分类号： G06T7/0004 ,  G01N21/9515 ,  G06T2207/20004 ,  G06T2207/20036 ,  G06T2207/30156

摘要： A method of inspecting a curved surface of a workpiece by a surface inspecting apparatus provided with a projecting device for illuminating the workpiece surface to be inspected with detection light, a detecting device for receiving and detecting the light reflected from the workpiece surface, and a condensing optical system for causing the reflected light to converge on a light-receiving surface of the detecting device. According to the method, the surface inspecting apparatus is successively displaced along the workpiece surface and the reflected light is detected by the detecting device. Further, image data obtained from the detecting device is held and binary digitized. It is determined whether or not the workpiece surface to be inspected is planar. If it is not planar, then the digitized image data is processed for dilation and erosion. Thus, when the workpiece surface is curved, faulty or defective spots can be reliably detected. If the workpiece surface is planar, the time required to process an image can be shortened.

摘要翻译： 一种通过表面检查装置检查工件的曲面的方法，该表面检查装置具有用于用检测光照亮待检查的工件表面的突出装置，用于接收和检测从工件表面反射的光的检测装置和冷凝 光学系统，用于使反射光会聚到检测装置的光接收表面上。 根据该方法，表面检查装置沿着工件表面连续移位，并且检测装置检测反射光。 此外，从检测装置获得的图像数据被保持二进制数字化。 确定待检查的工件表面是否是平面的。 如果不是平面的，则数字化图像数据被处理用于扩张和侵蚀。 因此，当工件表面弯曲时，可以可靠地检测到故障或缺陷点。 如果工件表面是平面的，则可以缩短处理图像所需的时间。

公开(公告)号：US08576378B2

公开(公告)日：2013-11-05

申请号：US12239059

申请日：2008-09-26

申请人： Kenichiro Mori

发明人： Kenichiro Mori

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70091 ,  G03F7/70566

摘要： An illumination optical system comprises a first polarization control unit which is located between a light source and a pupil of an illumination optical system, and a second polarization control unit which is located between the first polarization control unit and the pupil, wherein a region on the pupil includes a plurality of partial regions which are classified into a first group including a partial region having a largest area, and a second group including a partial region different from the partial region having the largest area, and the second polarization control unit controls a polarization state in the partial region which belongs to only the second group.

摘要翻译： 照明光学系统包括位于照明光学系统的光源和光瞳之间的第一偏振控制单元和位于第一偏振控制单元和瞳孔之间的第二偏振控制单元，其中， 瞳孔包括分为包括具有最大面积的部分区域的第一组的多个部分区域和包括与具有最大面积的部分区域不同的部分区域的第二组，并且第二偏振控制单元控制偏振 在仅属于第二组的部分区域中的状态。

公开(公告)号：US20050219498A1

公开(公告)日：2005-10-06

申请号：US11095889

申请日：2005-03-31

申请人： Kenichiro Mori

发明人： Kenichiro Mori

IPC分类号： G03F7/20 ,  G03B27/72 ,  H01L21/027

CPC分类号： G03B27/72 ,  G03F7/70566 ,  G03F7/7085

摘要： An illumination optical system for illuminating a target surface using light from a light source, includes a sensor for detecting a light intensity of the light, a light splitter for splitting part of the light, and an optical element, arranged between the light source and the light splitter, for transmitting the light, and for reflecting the part of the light that has been split by the light splitter, towards the sensor.

摘要翻译： 一种用于使用来自光源的光照射目标表面的照明光学系统，包括用于检测光的光强的传感器，用于分离光的一部分的光分离器和布置在光源和光源之间的光学元件 光分路器，用于透射光，并用于将已被光分离器分裂的光的一部分反射到传感器。

公开(公告)号：US06573977B1

公开(公告)日：2003-06-03

申请号：US09534126

申请日：2000-03-23

申请人： Kenichiro Mori

发明人： Kenichiro Mori

IPC分类号： G03B2772

CPC分类号： G03F7/70058 ,  G03B27/72

摘要： A method of controlling an amount of exposure, in which, when a pattern on a reticle is illuminated by illuminating light from a light source so as to be projected onto a substrate, an amount of light at a position substantially conjugate with a projected area on the substrate is measured and an amount of exposure applied to the substrate is controlled based upon a result of this measurement. The position at which the amount of light is measured is a position substantially conjugate with an off-optical-axis position in the projected area on the substrate.

摘要翻译： 一种控制曝光量的方法，其中当通过照射来自光源的光以将其投影到基板上来照明掩模版上的图案时，基本上与投影面积共轭的位置处的光量 基于该测量的结果，测量基板并施加到基板的曝光量。 测量光量的位置是与基板上的投影区域中的离轴位置基本共轭的位置。

公开(公告)号：US08760627B2

公开(公告)日：2014-06-24

申请号：US13093309

申请日：2011-04-25

申请人： Kenichiro Mori

发明人： Kenichiro Mori

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72 ,  G03F7/20

CPC分类号： G03F7/70066 ,  G03F7/70091

摘要： A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from being incident on an outer peripheral region located outside the circular boundary line; a first driving unit which rotates the light-shielding plate about an axis parallel to an optical axis of the irradiation system; and a second driving unit which linearly drives the light-shielding plate within a plane perpendicular to the optical axis.

摘要翻译： 光刻设备包括：遮光板，在其边缘上包括与圆形边界线重叠的圆弧，该圆形边界线限定图案被转印到其上的区域，并且位于基板的外周边内， 光以防止光入射到位于圆形边界线外部的外周区域; 围绕与所述照射系统的光轴平行的轴旋转所述遮光板的第一驱动单元; 以及第二驱动单元，其在与所述光轴垂直的平面内直线驱动所述遮光板。

公开(公告)号：US20130124184A1

公开(公告)日：2013-05-16

申请号：US13634907

申请日：2011-02-14

申请人： Yasunori Sakaguchi ,  Kenichiro Mori

发明人： Yasunori Sakaguchi ,  Kenichiro Mori

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G05B19/4069 ,  G05B2219/32352 ,  Y02P90/26

摘要： A sequence control portion of a control program is configured to execute simulation for one period to generate an execution result related to the sequence control portion. A motion control portion is configured to execute simulation for one period to generate an execution result related to the motion control portion. A control period number is then increment updated. Whether or not a resumable control period is determined, and if determined as the resumable control period, content of a resuming data buffer (828) updated in the previous control period is saved in a resuming data storage section (826).

摘要翻译： 控制程序的序列控制部分被配置为执行一个周期的模拟以产生与序列控制部分相关的执行结果。 运动控制部分被配置为执行一个周期的模拟以产生与运动控制部分相关的执行结果。 然后对控制周期数进行更新。 无论确定了可恢复控制周期，并且如果被确定为可恢复控制周期，则将在先前控制周期中更新的恢复数据缓冲器（828）的内容保存在恢复数据存储部分（826）中。

公开(公告)号：US20080036992A1

公开(公告)日：2008-02-14

申请号：US11837113

申请日：2007-08-10

申请人： Kenichiro Mori ,  Tomoaki Kawakami

发明人： Kenichiro Mori ,  Tomoaki Kawakami

IPC分类号： G03B27/72

CPC分类号： G03B27/72 ,  G03F7/70566

摘要： An exposure apparatus comprises an illumination optical system and a projection optical system. The illumination optical system includes an optical integrator configured to emit a plurality of light fluxes from an exit surface thereof, a diffraction optical element configured to form a predetermined light intensity distribution on an incident surface of the optical integrator, and a polarization optical element configured to adjust a polarization state of the incident light. The polarization optical element has a pattern with which the polarization optical element functions as a birefringent element, the pattern changing in density between a first direction and a second direction perpendicular to the first direction, and having a sub wavelength structure having a cycle not more than a wavelength of the light from the light source, and the polarization optical element is arranged near or on the incident surface on which the diffraction optical element forms the light intensity distribution.

摘要翻译： 曝光装置包括照明光学系统和投影光学系统。 照明光学系统包括：光积分器，被配置为从其出射表面发射多个光束;衍射光学元件，被配置为在所述光学积分器的入射表面上形成预定的光强度分布;以及偏振光学元件，被配置为 调整入射光的偏振状态。 偏振光学元件具有这样的图案，其中偏振光学元件用作双折射元件，该图案在第一方向和垂直于第一方向的第二方向之间的密度变化，并且具有不大于 来自光源的光的波长和偏振光学元件布置在衍射光学元件形成光强度分布的入射表面附近或之上。