摘要:
A sequence control portion of a control program is configured to execute simulation for one period to generate an execution result related to the sequence control portion. A motion control portion is configured to execute simulation for one period to generate an execution result related to the motion control portion. A control period number is then increment updated. Whether or not a resumable control period is determined, and if determined as the resumable control period, content of a resuming data buffer (828) updated in the previous control period is saved in a resuming data storage section (826).
摘要:
To provide a display device capable of displaying a trajectory of a specific portion of a program controlled control target device regardless of whether the control program is a simple sequential execution type or a situation adaptive type. A PC (10), which is a display device, includes a command value acquiring section (1131) configured to acquire command values of a series of positions, which is an execution result of the control program; a position calculating section (1132) configured to obtain a series of positions of the specific portion for every control period or in a plurality of specified control periods corresponding to the acquired command values of the series of positions; a trajectory data creating section (1133) configured to create trajectory data showing a trajectory that passes each of the series of positions of the specific portion in order of elapse of time; an image data creating section (1134) configured to create image data for displaying a spatial mode of the trajectory on the screen as an image using the trajectory data; and a display control section (1011) configured to display the image on the screen using the image data.
摘要:
To provide a display device capable of displaying a trajectory of a specific portion of a program controlled control target device regardless of whether the control program is a simple sequential execution type or a situation adaptive type. A PC (10), which is a display device, includes a command value acquiring section (1131) configured to acquire command values of a series of positions, which is an execution result of the control program; a position calculating section (1132) configured to obtain a series of positions of the specific portion for every control period or in a plurality of specified control periods corresponding to the acquired command values of the series of positions; a trajectory data creating section (1133) configured to create trajectory data showing a trajectory that passes each of the series of positions of the specific portion in order of elapse of time; an image data creating section (1134) configured to create image data for displaying a spatial mode of the trajectory on the screen as an image using the trajectory data; and a display control section (1011) configured to display the image on the screen using the image data.
摘要:
A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from being incident on an outer peripheral region located outside the circular boundary line; a first driving unit which rotates the light-shielding plate about an axis parallel to an optical axis of the irradiation system; and a second driving unit which linearly drives the light-shielding plate within a plane perpendicular to the optical axis.
摘要:
An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.
摘要:
An illumination optical system for illuminating a target surface using light from a light source, includes a sensor for detecting a light intensity of the light, a light splitter for splitting part of the light, and an optical element, arranged between the light source and the light splitter, for transmitting the light, and for reflecting the part of the light that has been split by the light splitter, towards the sensor.
摘要:
A method for forming a three-dimensional structure made of a photosensitive material on a substrate includes the steps of determining a film thickness of the photosensitive material necessary to form the desired three-dimensional structure, comparing a predetermined maximum film thickness with the film thickness determined by the determining step, and applying, when the film thickness determined by the determining step is greater than the predetermined maximum film thickness, the photosensitive material within the maximum film thickness plural times until the photosensitive material has the film thickness on the substrate.
摘要:
An illumination optical system for illuminating a target surface using light from a light source, said illumination optical system includes a polarizing element that is arranged in an optical path from the light source to the target surface, and adjusts a polarization ratio of the light, and an optical element that is arranged in an optical path from the polarizing element to the target surface, wherein the total birefringence of the optical element is m+2σ
摘要:
An exposure amount control method includes steps of illuminating an original with exposure light, emitted from a light source, through one or more light intensity uniforming optical systems, so that a pattern of the original illuminated is projected and printed on a substrate, measuring, by use of a first illuminance sensor, and illuminance of the exposure light as branched at a light source of the or one of the light intensity uniforming optical systems which is closest to the original, controlling an exposure amount of the substrate on the basis of a measurement output of the first illuminance sensor, measuring, by use of a second illuminance sensor, an illuminance at a position substantially conjugate with the substrate, and calibrating an output of the first illuminance sensor on the basis of a measurement output of the second illuminance sensor.
摘要:
An illumination system includes an optical system, an optical integrator and a condenser. The optical system collects light from a light source and includes a mirror for reflecting the light. The mirror has an ellipsoidal reflection surface of a shape being out of axial symmetry for defining an aperture of rectangular or semicircular shape as seen in an optical axis direction. The optical integrator produces plural light beams by use of light from the optical system and includes an array of condensing elements having a light entrance surface of rectangular shape as seen in the optical axis direction. A lengthwise direction of the rectangular-shaped or semicircular-shaped aperture of the ellipsoidal reflection surface corresponds to a lengthwise direction of the rectangular-shape light entrance surface of the condensing elements. The condenser illuminates a surface to be illuminated by use of the plural light beams.