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公开(公告)号：US4595570A
公开(公告)日：1986-06-17
申请号：US772208
申请日：1985-09-05
CPC分类号： H01J37/32357 , B01J3/006 , B05D3/144 , B29C59/14
摘要： An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber. A plasma introducing port is formed in the wall of the reaction chamber. A plasma-irradiating pipe is connected to the plasma introducing port for injecting the plasma into the reaction chamber to irradiate the surfaces of the works. A discharge port is formed in the wall of the reaction chamber to reduce the internal pressure of the reaction chamber. A plasma diffuser includes a rotatable vane for diffusing the flow of plasma to distribute uniform density of plasma in the reaction chamber. A plurality of deflecting plates projecting from the inner wall of the reaction chamber toward the interior thereof may also be provided to diffuse the flow of plasma in the reaction chamber. In a method, a plurality of the works are rotated in relation to each other about a common axis, and also individual works are rotated independently from each other about their own axes.
摘要翻译： 一种用于等离子体处理的装置，其能够通过在真空反应室内用微波放电等离子体照射工件的表面来等离子体处理树脂材料的工作。 在反应室的壁上形成等离子体引入口。 等离子体照射管连接到等离子体引入口，用于将等离子体注入到反应室中以照射工件的表面。 在反应室的壁上形成排出口，以减小反应室的内部压力。 等离子体扩散器包括用于扩散等离子体流以在反应室中分配均匀密度的等离子体的可旋转叶片。 还可以设置从反应室的内壁向其内部突出的多个偏转板，以使等离子体的流动扩散到反应室中。 在一种方法中，多个作品围绕公共轴线相对于彼此旋转，并且单个作品围绕其自己的轴线彼此独立地旋转。
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公开(公告)号：US4919745A
公开(公告)日：1990-04-24
申请号：US307509
申请日：1989-02-08
CPC分类号： H01J37/32357 , B01J3/006 , B05D3/144 , B29C59/14
摘要： An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber. A plasma introducing port is formed in the wall of the reaction chamber. A plasma-irradiating pipe is connected to the plasma introducing port for injecting the plasma into the reaction chamber to irradiate the surfaces of the works. A discharge port is formed in the wall of the reaction chamber to reduce the internal pressure of the reaction chamber. A plasma diffuser includes a rotatable vane for diffusing the flow of plasma to distribute uniform density of plasma in the reaction chamber. A plurality of deflecting plates projecting from the inner wall of the reaction chamber toward the interior thereof may also be provided to diffuse the flow of plasma in the reaction chamber. In a method, a plurality of the works are rotated in relation to each other about a common axis, and also individual works are rotated independently from each other about their own axes.
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公开(公告)号：US4690097A
公开(公告)日：1987-09-01
申请号：US931012
申请日：1986-11-17
CPC分类号： B05C9/10 , B01J19/126 , B01J3/006 , B29C59/14 , B01J2219/0894 , B01J2219/1942
摘要： A method for applying surface plasma-treating to works of resin material in a reaction chamber by irradiating the surfaces of the works with a microwave discharge plasma within the reaction chamber, comprising injection the plasma from a plurality of positions located adjacently to the inner wall of the reaction chamber, and injecting the plasma from each injecting position in a certain spreading angle along the direction of injection. An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber which is in the form of a circular cylinder of 1000 mm or more in diameter, the form of a square prism of 1000 mm or more in the length of a side of the analogous form, comprising a plurality of plasma introducing ports formed in the wall of the reaction chamber at optional positions thereon; and a glass pipe connected to each plasma introducing port for injecting the plasma into the reaction chamber in a certain spreading angle along the direction of injection.
摘要翻译： 一种通过在反应室内用微波放电等离子体照射工件的表面，在反应室中对树脂材料的工作进行表面等离子体处理的方法，包括：将等离子体从位于邻近内壁的多个位置 反应室，并且沿着注射方向以一定的扩展角度从每个注射位置注入等离子体。 一种用于等离子体处理的装置，其能够通过在直径为1000mm或更大的圆柱体形式的真空反应室内用微波放电等离子体照射工件的表面来等离子体处理树脂材料的工作， 在类似形式的一侧的长度上具有1000mm或更大的方形棱镜的形式，包括在其上的任选位置处形成在反应室的壁中的多个等离子体引入口; 以及连接到每个等离子体引入口的玻璃管，用于沿着注射方向以一定的扩展角将等离子体注入到反应室中。
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公开(公告)号：US4678644A
公开(公告)日：1987-07-07
申请号：US825941
申请日：1986-01-30
CPC分类号： H01J37/32357 , B29C59/14 , H01J37/18 , B01J2219/0894 , B01J2219/1942 , B29K2023/00 , H01J2237/1825 , H01J2237/336
摘要： An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber, comprises a plurality of long plasma-irradiating tubular pipes, each of which is provided along the length thereof with numerous small holes for injecting plasma, and at least one plasma-irradiating straight pipe disposed with its free end opening toward a section to which the plasma is hard to flow. At least one second plasma-irradiating pipe is located movably to an optional position within the reaction chamber. A method for surface plasma-treatment comprises dividing a microwave generated in a magnetron in a plurality of microwaves by a distributor, introducing the divided microwaves into a plurality of plasma generating mechanisms, respectively, and introducing plasmas generated in the respective plasma generating mechanisms into the reaction chamber through a plurality of plasma introducing ports, respectively, formed in the wall of the reaction chamber.
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5.发明授权Method for controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus 失效用于控制微波激发的氧等离子体表面处理装置的操作的方法
公开(公告)号：US4576692A
公开(公告)日：1986-03-18
申请号：US619174
申请日：1984-06-11
CPC分类号： H05H1/46 , B01J19/0006 , B01J19/126 , B29C59/14 , B01J2219/0894 , B29C2037/903
摘要： A method for sequentially controlling the operation of a microwave-excited oxygen plasma surface treatment apparatus in order to improve and control the quality of surface treatment. The pressure within a reactor (10) is continuously monitored and measured and a first pressure signal is issued when the pressure is reduced to a predetermined first level, whereupon flow control valves (52, 54) are opened to allow oxygen gas to flow through microwave discharge tubes (34) into the reactor (10). A second pressure signal is issued when the pressure increases to a second pressure range and microwave power generators (20, 22) are energized to excite the oxygen flowing therethrough. The plasma density is continuously monitored and measured, preferably in terms of the luminous intensity of the plasma, the amount of reflected microwave power, or a combination thereof. The plasma surface treatment is terminated after a timed duration.
摘要翻译： 为了改善和控制表面处理的质量，依次控制微波激发的氧等离子体表面处理装置的操作的方法。 反应器（10）内的压力被连续监测和测量，并且当压力降低到预定的第一水平时，发出第一压力信号，于是打开流量控制阀（52,54）以允许氧气流过微波 放电管（34）进入反应器（10）。 当压力增加到第二压力范围时，发出第二压力信号，并且激励微波发电机（20,22）以激励流过其中的氧气。 连续监测和测量等离子体密度，优选根据等离子体的发光强度，反射的微波功率的量或其组合。 等离子体表面处理在定时持续时间后终止。
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公开(公告)号：US4874453A
公开(公告)日：1989-10-17
申请号：US817115
申请日：1986-01-08
CPC分类号： H01J37/32357 , B01J3/006 , B05D3/144 , B29C59/14
摘要： An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber. A plasma introducing port is formed in the wall of the reaction chamber. A plasma-irradiating pipe is connected to the plasma introducing port for injecting the plasma into the reaction chamber to irradiate the surfaces of the works. A discharge port is formed in the wall of the reaction chamber to reduce the internal pressure of the reaction chamber. A plasma diffuser includes a rotatable vane for diffusing the flow of plasma to distribute uniform density of plasma in the reaction chamber. A plurality of deflecting plates projecting from the inner wall of the reaction chamber toward the interior thereof may also be provided to diffuse the flow of plasma in the reaction chamber. In a method, a plurality of the works are rotated in relation to each other about a common axis, and also individual works are rotated independently from each other about their own axes.
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公开(公告)号：US4786522A
公开(公告)日：1988-11-22
申请号：US58287
申请日：1987-06-04
CPC分类号： B01J19/126 , B01J3/006 , B05C9/10 , B29C59/14 , B01J2219/0894 , B01J2219/1227 , B01J2219/1942
摘要： A method for applying surface plasma-treating to works of resin material in a reaction chamber by irradiating the surfaces of the works with a microwave discharge plasma within the reaction chamber, comprising injection the plasma from a plurality of positions located adjacently to the inner wall of the reaction chamber, and injecting the plasma from each injecting position in a certain spreading angle along the direction of injection. An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber which is in the form of a circular cylinder of 1000 mm or more in diameter, the form of a square prism of 1000 mm or more in the length of a side or the analogous form, comprising a plurality of plasma introducing ports formed in the wall of the reaction chamber at optional positions thereon; and a glass pipe connected to each plasma introducing port for injecting the plasma into the reaction chamber in a certain spreading angle along the direction of injection.
摘要翻译： 一种通过在反应室内用微波放电等离子体照射工件的表面，在反应室中对树脂材料的工作进行表面等离子体处理的方法，包括：将等离子体从位于邻近内壁的多个位置 反应室，并且沿着注射方向以一定的扩展角度从每个注射位置注入等离子体。 一种用于等离子体处理的装置，其能够通过在直径为1000mm或更大的圆柱体形式的真空反应室内用微波放电等离子体照射工件的表面来等离子体处理树脂材料的工作， 在侧面或类似形式的长度上具有1000mm或更大的方形棱柱的形式，包括在其上的任选位置处形成在反应室的壁中的多个等离子体引入口; 以及连接到每个等离子体引入口的玻璃管，用于沿着注射方向以一定的扩展角将等离子体注入到反应室中。
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