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公开(公告)号：US09229161B2
公开(公告)日：2016-01-05
申请号：US13729922
申请日：2012-12-28
申请人： Kenji Todori , Yoshiaki Fukuzumi , Hideaki Aochi , Tsukasa Tada , Ko Yamada , Shigehiko Mori , Naomi Shida , Reiko Yoshimura
发明人： Kenji Todori , Yoshiaki Fukuzumi , Hideaki Aochi , Tsukasa Tada , Ko Yamada , Shigehiko Mori , Naomi Shida , Reiko Yoshimura
CPC分类号： G02B6/12 , B82Y20/00 , G02B6/122 , G02B6/1223 , G02B6/125
摘要： According to one embodiment, a waveguide includes: a substrate and a member. The member covers at least a part of the substrate and has a difference in the refractive index from the substrate not less than 2. A plurality of concave parts are provided on the substrate. The concave parts are arrayed on an upper face of the substrate. At least a part of a side face of each of the concave parts includes an arc. An inner diameter of each of the concave parts is not more than 50 nm. Intervals of the neighboring concave parts are not more than the inner diameter. The member fills the concave part.
摘要翻译： 根据一个实施例，波导包括：基板和部件。 该构件覆盖基板的至少一部分，并且其折射率与基板的折射率不同不小于2.在基板上设置多个凹部。 凹部排列在基板的上表面上。 每个凹部的侧面的至少一部分包括弧。 每个凹部的内径不大于50nm。 相邻凹部的间隔不大于内径。 构件填充凹部。
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公开(公告)号：US20130251306A1
公开(公告)日：2013-09-26
申请号：US13729922
申请日：2012-12-28
申请人： Kenji TODORI , Yoshiaki Fukuzumi , Hideaki Aochi , Tsukasa Tada , Ko Yamada , Shigehiko Mori , Naomi Shida , Reiko Yoshimura
发明人： Kenji TODORI , Yoshiaki Fukuzumi , Hideaki Aochi , Tsukasa Tada , Ko Yamada , Shigehiko Mori , Naomi Shida , Reiko Yoshimura
IPC分类号： G02B6/12
CPC分类号： G02B6/12 , B82Y20/00 , G02B6/122 , G02B6/1223 , G02B6/125
摘要： According to one embodiment, a waveguide includes: a substrate and a member. The member covers at least a part of the substrate and has a difference in the refractive index from the substrate not less than 2. A plurality of concave parts are provided on the substrate. The concave parts are arrayed on an upper face of the substrate. At least a part of a side face of each of the concave parts includes an arc. An inner diameter of each of the concave parts is not more than 50 nm. Intervals of the neighboring concave parts are not more than the inner diameter. The member fills the concave part.
摘要翻译： 根据一个实施例，波导包括：基板和部件。 该构件覆盖基板的至少一部分并且具有不小于2的基板的折射率差。在基板上设置多个凹部。 凹部排列在基板的上表面上。 每个凹部的侧面的至少一部分包括弧。 每个凹部的内径不大于50nm。 相邻凹部的间隔不大于内径。 构件填充凹部。
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3.发明申请NEAR-FIELD EXPOSURE MASK, RESIST PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, NEAR-FIELD EXPOSURE METHOD, PATTERN FORMING METHOD, NEAR-FIELD OPTICAL LITHOGRAPHY MEMBER, AND NEAR-FIELD NANOIMPRINT METHOD 有权近场曝光掩模，电阻图案形成方法，器件制造方法，近场曝光方法，图案形成方法，近场光学成像方法和近场纳米方法公开(公告)号：US20120228804A1
公开(公告)日：2012-09-13
申请号：US13413163
申请日：2012-03-06
申请人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
发明人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
CPC分类号： B29C59/16 , B29D11/0074 , B29L2011/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/70325
摘要： A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
摘要翻译： 根据实施例的近场曝光掩模包括：硅衬底; 以及形成在所述硅基板上的近场光产生单元，所述近场光产生单元是包含选自Au，Al，Ag，Cu，Cr，Sb，W中的至少一种元素的层 ，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由其中一些材料制成的层形成的膜叠层。
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4.发明授权Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method 有权近场曝光掩模，抗蚀剂图案形成方法，器件制造方法，近场曝光方法，图案形成方法，近场光刻部件和近场纳米压印法公开(公告)号：US09029047B2
公开(公告)日：2015-05-12
申请号：US13413163
申请日：2012-03-06
申请人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
发明人： Naomi Shida , Kenji Todori , Shigehiko Mori , Ko Yamada , Masakazu Yamagiwa , Reiko Yoshimura , Yasuyuki Hotta , Tsukasa Tada , Hiroyuki Kashiwagi , Ikuo Yoneda
CPC分类号： B29C59/16 , B29D11/0074 , B29L2011/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/70325
摘要： A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
摘要翻译： 根据实施例的近场曝光掩模包括：硅衬底; 以及形成在所述硅基板上的近场光产生单元，所述近场光产生单元是包含选自Au，Al，Ag，Cu，Cr，Sb，W中的至少一种元素的层 ，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由其中一些材料制成的层形成的膜叠层。
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