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公开(公告)号:US20080105202A9
公开(公告)日:2008-05-08
申请号:US10680656
申请日:2003-10-06
IPC分类号: C23C16/00 , H01L21/306
CPC分类号: H01L21/67167 , C23C16/4412 , C23C16/54 , H01L21/67017 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/67201
摘要: The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.
摘要翻译: 本发明提供了一种用于真空处理的设备,其通常包括具有形成在其中的多个隔离室的外壳,设置在每个处理室中的气体分配组件,连接到多个隔离室的气源,以及连接到每个 气体分配组件