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公开(公告)号:US10784410B2
公开(公告)日:2020-09-22
申请号:US16315081
申请日:2017-07-25
Inventor: Tien Khee Ng , Chao Zhao , Davide Priante , Boon S. Ooi , Mohamed Ebaid Abdrabou Hussein
IPC: H01L33/56 , H01L33/44 , C25B1/00 , H01L31/0216 , C25B1/04 , H01L31/18 , H01L31/0304 , H01L33/20 , H01L33/32
Abstract: Gallium nitride based semiconductors are provided having one or more passivated surfaces. The surfaces can have a plurality of thiol compounds attached thereto for enhancement of optoelectronic properties and/or solar water splitting properties. The surfaces can also include wherein the surface has been treated with chemical solution for native oxide removal and/or wherein the surface has attached thereto a plurality of nitrides, oxides, insulating compounds, thiol compounds, or a combination thereof to create a treated surface for enhancement of optoelectronic properties and/or solar water splitting properties. Methods of making the gallium nitride based semiconductors are also provided. Methods can include cleaning a native surface of a gallium nitride semiconductor to produce a cleaned surface, etching the cleaned surface to remove oxide layers on the surface, and applying single or multiple coatings of nitrides, oxides, insulating compounds, thiol compounds, or a combination thereof attached to the surface.