公开(公告)号：US20240105420A1

公开(公告)日：2024-03-28

申请号：US18332203

申请日：2023-06-09

Applicant: Kioxia Corporation

Inventor： Katsuyoshi KODERA ,  Shoji MIMOTOGI ,  Shunko MAGOSHI ,  Ryuji OGAWA ,  Taiki KIMURA

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  H01J2237/31762 ,  H01J2237/31776

Abstract: A data generation apparatus of one embodiment includes a processing unit, an evaluation unit, and a conversion unit. The processing unit designs, through optical proximity correction based on a target pattern formed on a substrate using the photomask, a mask pattern corresponding to the target pattern and including a plurality of rectangular regions. The evaluation unit evaluates the mask pattern using a cost function having, as a parameter, a jog length indicating a length of each of the rectangular regions included in the mask pattern in a first direction. The conversion unit converts mask pattern data indicating the mask pattern with an evaluation that meets a predetermined condition to drawing data corresponding to a variable shaped beam drawing process.