公开(公告)号：US20230089403A1

公开(公告)日：2023-03-23

申请号：US17668489

申请日：2022-02-10

Applicant: Kioxia Corporation

Inventor： Taiki KIMURA ,  Tetsuaki MATSUNAWA

IPC: G03F1/36

Abstract: According to one embodiment, a mask design method includes the following configuration. The method includes setting evaluation points on a circuit pattern created based on design data, setting a parameter that defines a shape of the mask pattern on the mask pattern corresponding to the circuit pattern and calculating an optical image intensity on the evaluation points set on the circuit pattern based on the mask pattern and the parameter. The method includes calculating an evaluation value relating to the optical image intensity by an objective function based on the optical image intensity and optimizing the parameter using a value of a partial differential for the parameter in the objective function to minimize the evaluation value calculated by the objective function.

公开(公告)号：US20240273276A1

公开(公告)日：2024-08-15

申请号：US18436435

申请日：2024-02-08

Applicant: Kioxia Corporation

Inventor： Taiki KIMURA

IPC: G06F30/392 ,  G06F30/398

CPC classification number: G06F30/392 ,  G06F30/398

Abstract: According to one embodiment, a layout generation device includes: an extraction unit extracting a plurality of origins from design data for a photomask; an obtainment unit obtaining a region corresponding to each of the origins; a grouping unit classifying the origins into one or more groups; and a layering unit transforming a distribution of origins corresponding to each of the one or more groups into layers. One or more sets of origins that form an equivalent pattern within regions corresponding to the origins are classified into an identical group. The layering unit is configured to repeat: extracting a periodicity from a first distribution corresponding to a first layer being the highest layer of the distribution; aggregating the first distribution into a second distribution based on the periodicity; and placing a second layer of the second distribution as a higher layer than the first layer of the first distribution.

公开(公告)号：US20240105420A1

公开(公告)日：2024-03-28

申请号：US18332203

申请日：2023-06-09

Applicant: Kioxia Corporation

Inventor： Katsuyoshi KODERA ,  Shoji MIMOTOGI ,  Shunko MAGOSHI ,  Ryuji OGAWA ,  Taiki KIMURA

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  H01J2237/31762 ,  H01J2237/31776

Abstract: A data generation apparatus of one embodiment includes a processing unit, an evaluation unit, and a conversion unit. The processing unit designs, through optical proximity correction based on a target pattern formed on a substrate using the photomask, a mask pattern corresponding to the target pattern and including a plurality of rectangular regions. The evaluation unit evaluates the mask pattern using a cost function having, as a parameter, a jog length indicating a length of each of the rectangular regions included in the mask pattern in a first direction. The conversion unit converts mask pattern data indicating the mask pattern with an evaluation that meets a predetermined condition to drawing data corresponding to a variable shaped beam drawing process.