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公开(公告)号:US20230200050A1
公开(公告)日:2023-06-22
申请号:US17841129
申请日:2022-06-15
Applicant: Kioxia Corporation
Inventor: Akifumi GAWASE , Ha HOANG , Atsuko SAKATA , Yuta KAMIYA , Kazuhiro MATSUO , Keiichi SAWA , Kota TAKAHASHI , Kenichiro TORATANI , Yimin LIU
IPC: H01L27/108 , H01L29/786 , H01L29/66
CPC classification number: H01L27/10805 , H01L29/78642 , H01L29/7869 , H01L29/66969 , H01L27/10873
Abstract: A semiconductor device of embodiments includes: a first electrode; a second electrode; an oxide semiconductor layer between the first electrode and the second electrode; a gate electrode surrounding the oxide semiconductor layer; a gate insulating layer between the gate electrode and the oxide semiconductor layer; a first insulating layer provided between the first electrode and the gate electrode; and a second insulating layer provided between the second electrode and the gate electrode. In a cross section parallel to a first direction from the first electrode to the second electrode, a first portion of the oxide semiconductor layer is provided between the gate insulating layer and the first electrode. In the cross section, a second portion of the oxide semiconductor layer is provided between the gate insulating layer and the second electrode.
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公开(公告)号:US20230307358A1
公开(公告)日:2023-09-28
申请号:US17942005
申请日:2022-09-09
Applicant: Kioxia Corporation
Inventor: Akifumi GAWASE , Yimin LIU
IPC: H01L23/528 , H01L21/768
CPC classification number: H01L23/528 , H01L21/76802 , H01L21/76877
Abstract: A semiconductor device includes first conductive layers, a width in a first direction thereof being a first width, a second conductive layer arranged with first conductive layers, a smaller one of a width in the first direction thereof and a width in a second direction thereof being a second width that is larger than the first width, a third conductive layer in contact with one end portion of at least one of first conductive layers, and a fourth conductive layer in contact with one end portion of the second conductive layer. The at least one of first conductive layers and the second conductive layer contain a first metal, a second metal, and oxygen (O). A concentration of the first metal of the at least one of first conductive layers is higher than a concentration of the first metal of the second conductive layer.
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