Reflective mask
    2.
    发明授权

    公开(公告)号:US11366380B2

    公开(公告)日:2022-06-21

    申请号:US17003929

    申请日:2020-08-26

    发明人: Eishi Shiobara

    IPC分类号: G03F1/24

    摘要: According to one embodiment, a reflective mask comprises a reflection layer including a first region having a plurality of first patterns, a second region surrounding the first region, and a third region within the second region. The reflection layer includes a stack of alternating first layers and second layers. An absorber film covers the second region and has a second pattern that includes an opening exposing a portion of the third region. In some examples, the third region can include a plurality of third patterns therein.