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    Process for manufacturing planographic printing plate
    1.
    发明授权
    Process for manufacturing planographic printing plate 失效
    平版印刷版制造工艺

    公开(公告)号：US5380612A

    公开(公告)日：1995-01-10

    申请号：US59750

    申请日：1993-05-12

    申请人： Yasuo Kojima ,  Katsura Hirai ,  Kiyoshi Goto

    发明人： Yasuo Kojima ,  Katsura Hirai ,  Kiyoshi Goto

    IPC分类号： G03G13/26 ,  G03G5/05 ,  G03G5/07 ,  G03G13/28 ,  G03G13/10 ,  G03G13/22 ,  G03G13/12

    CPC分类号： G03G13/28 ,  G03G5/0517 ,  G03G5/075

    摘要： A process for manufacturing a planographic printing plate using a photosensitive planographic printing plate comprising a conductive support and provided thereon, a photoconductive layer containing an alkali soluble resin, a photoconductor and a photosolubilizable photosensitive compound comprises the steps of forming an electrophotographic latent image on the photoconductive layer, developing the latent image with liquid developer to form a toner image layer, uniformly exposing overall to actinic light the entire photoconductive layer, and removing the photoconductive layer where no toner image layer has been formed, the transmission density of the toner image layer to the actinic light being not less than 0.6, and the transmission density per unit thickness of the toner image layer to the actinic light being not less than 0.03 dm.sup.2 /g.

    摘要翻译： 使用包含导电性支持体并设置在其上的光敏平版印刷版的平版印刷版的制造方法，含有碱溶性树脂的感光层，光电导体和光致变色性感光性化合物，包括以下步骤：在光电导 层，用液体显影剂显影潜像以形成调色剂图像层，整体光敏光均匀地曝光整个光电导层，以及除去其上没有形成调色剂图像层的光电导层，调色剂图像层的透射密度 光化光不小于0.6，并且调色剂图像层与光化光的每单位厚度的透射密度不小于0.03dm 2 / g。

    Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
    2.
    发明授权
    Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive 失效
    利用具有含有邻萘醌二叠氮化物磺酸酯，碱溶性树脂和选择添加剂的感光层的铝基板的平版印刷版

    公开(公告)号：US5238771A

    公开(公告)日：1993-08-24

    申请号：US963001

    申请日：1992-10-19

    申请人： Kiyoshi Goto ,  Hideyuki Nakai ,  Hiroshi Tomiyasu ,  Yoshiko Kobayashi

    发明人： Kiyoshi Goto ,  Hideyuki Nakai ,  Hiroshi Tomiyasu ,  Yoshiko Kobayashi

    IPC分类号： G03F7/023

    CPC分类号： G03F7/0233

    摘要： There are disclosed a photosensitive composition which comprises:(1) an o-naphtoquinonediazide compound;(2) an alkali soluble resin; and(3) any one selected from the groups consisting of:(a) an ester compound of a polyoxyalkylene sorbitol fatty acid and/or an ether compound of the fatty acid,(b) an alkylene oxide adduct of castor oil, hardened castor oil, lanolin alcohol, beeswax, phytosterol or phytostanol, and(c) at least one activator selected from the group consisting of polyoxypropylene alkyl ethers, polyoxypropylene alkylphenyl ethers and polyoxypropylene alkyl esters;.and a photosensitive lithographic printing plate which comprises a support; and a photosensitive layer formed by applying the above photosensitive composition.

    摘要翻译： 公开了一种光敏组合物，其包含：（1）邻萘醌二叠氮化合物; （2）碱溶性树脂; 和（3）选自以下的组中的任一种：（a）聚氧化烯山梨糖醇脂肪酸的酯化合物和/或脂肪酸的醚化合物，（b）蓖麻油的烯化氧加合物，硬化蓖麻油 ，羊毛脂醇，蜂蜡，植物甾醇或植物甾烷醇，和（c）至少一种选自聚氧丙烯烷基醚，聚氧丙烯烷基苯基醚和聚氧丙烯烷基酯的活化剂。 和包含支持体的感光性平版印刷版; 以及通过涂布上述感光性组合物形成的感光层。

    Light-sensitive lithographic printing plate wherein the support is treated with an aqueous solution containing nitrites
    4.
    发明授权
    Light-sensitive lithographic printing plate wherein the support is treated with an aqueous solution containing nitrites 失效
    使用含有NITRITE的水溶液处理支持的感光平版印刷板

    公开(公告)号：US5110710A

    公开(公告)日：1992-05-05

    申请号：US702104

    申请日：1991-05-15

    申请人： Yasuji Tomita ,  Hideyuki Nakai ,  Kiyoshi Goto

    发明人： Yasuji Tomita ,  Hideyuki Nakai ,  Kiyoshi Goto

    IPC分类号： B41N3/03

    CPC分类号： B41N3/038

    摘要： Disclosed is a light-sensitive lithographic printing plate which comprises an aluminum or aluminum alloy support having been pretreated and a light-sensitive layer provided thereon, wherein the surface of the support adjacent to the light-sensitive layer is treated by use of an aqueous solution containing at least one selected from the group consisting of nitric acid, nitrate, nitrous acid and nitrite. According to this invention, lithographic printing plates which are free from stain due to residual light-sensitive layer, excellent in developability, good in water retention at image area and excellent in press life, can be obtained.

    Photosensitive compositions
    6.
    发明授权
    Photosensitive compositions 失效
    感光组合物

    公开(公告)号：US4477553A

    公开(公告)日：1984-10-16

    申请号：US566778

    申请日：1983-12-29

    申请人： Takeshi Yamamoto ,  Kiyoshi Goto ,  Masafumi Uehara

    发明人： Takeshi Yamamoto ,  Kiyoshi Goto ,  Masafumi Uehara

    IPC分类号： C08G8/20 ,  C08G8/24 ,  C08K5/28 ,  G03F7/023 ,  G03C1/60 ,  G03C1/54 ,  G03F7/08

    CPC分类号： G03F7/0236 ,  C08G8/20 ,  C08G8/24 ,  C08K5/28

    摘要： There is disclosed a photosensitive composition comprising an o-quinonediazide compound and, as a binder resin, a resin containing in the molecule the unit represented by the following formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 have the same meanings as defined in the specification.The photosensitive composition according to the present invention has excellent resistance to chemicals and long press-life, and is excellent in alkali-solubility and difficult to form scumming.

    摘要翻译： 公开了一种包含邻醌二叠氮化合物和作为粘合剂树脂的光敏组合物，该树脂在分子中含有由下式表示的单元，其中R 1，R 2，R 3和R 4具有与 规格。 本发明的感光性组合物具有优异的耐化学性和长的压印寿命，碱溶性优异，难以形成浮渣。

    Method for producing curable resin and curable coating composition
    8.
    发明授权
    Method for producing curable resin and curable coating composition 失效
    固化性树脂及固化性涂料组合物的制造方法

    公开(公告)号：US4163763A

    公开(公告)日：1979-08-07

    申请号：US861198

    申请日：1977-12-16

    申请人： Shozo Tsuchiya ,  Hideo Hayashi ,  Makoto Sasaki ,  Kiyoshi Goto ,  Toru Matsubara

    发明人： Shozo Tsuchiya ,  Hideo Hayashi ,  Makoto Sasaki ,  Kiyoshi Goto ,  Toru Matsubara

    IPC分类号： C08F2/00 ,  C08F2/46 ,  C08F8/00 ,  C08F8/14 ,  C08F290/00 ,  C08F299/00 ,  C09D11/00 ,  C09D11/10 ,  C09D11/101 ,  C09D11/106 ,  C09D11/108 ,  C08F279/02

    CPC分类号： C08F8/14 ,  C08F2810/30

    摘要： The present invention provides a method for producing curable resin which comprises reacting acrylic acid and/or methacrylic acid [which is hereinafter cited as (metha-) acrylic acid] with hydroxyl group-containing resin (I) obtained by reacting a five-member cyclic compound having an unsaturated conjugated double bond represented by the general formula (A) given below; ##STR1## (WHEREIN R is an organic residue having from 1 to 3 carbon atoms; m and n are integers and are in the relation of m+n=6) or the Diels-Alder addition product thereof (A) and a compound (B) having both reactive carbon-carbon double bond or bonds and towo or more hydroxyl groups within one and the same molecule thereof. In accordance with the present invention, curable coating composition comprising said curable resin can also be obtained. The resin of this invention can be very quickly cured by the exposure to heat or radiation.

    摘要翻译： 本发明提供一种固化性树脂的制造方法，其特征在于，使丙烯酸和/或甲基丙烯酸（以下称为（甲基）丙烯酸）和含有羟基的树脂（I） 具有由下述通式（A）表示的不饱和共轭双键的化合物; （A）：（其中R是具有1至3个碳原子的有机残基; m和n是整数，并且与m + n = 6的关系）或其Diels-Alder加成产物（ A）和具有反应性碳 - 碳双键或键的化合物（B）和在其一个和相同分子内具有两个或更多个羟基。 根据本发明，也可以获得包含所述可固化树脂的可固化涂料组合物。 本发明的树脂可以通过暴露于热或辐射而非常快速地固化。

    METAL OR SEMICONDUCTOR MELT REFINEMENT METHOD, AND VACUUM REFINEMENT DEVICE
    9.
    发明申请
    METAL OR SEMICONDUCTOR MELT REFINEMENT METHOD, AND VACUUM REFINEMENT DEVICE 审中-公开
    金属或半导体熔融精炼方法和真空精炼装置

    公开(公告)号：US20150082942A1

    公开(公告)日：2015-03-26

    申请号：US14374941

    申请日：2012-02-06

    申请人： Yutaka Kishida ,  Hitoshi Dohnomae ,  Jiro Kondo ,  Kiyoshi Goto ,  Wataru Ohashi

    发明人： Yutaka Kishida ,  Hitoshi Dohnomae ,  Jiro Kondo ,  Kiyoshi Goto ,  Wataru Ohashi

    IPC分类号： F27B14/14 ,  C22B9/02 ,  B01D1/02 ,  F27B14/04 ,  F27B14/06 ,  C22B9/04 ,  F27D99/00

    CPC分类号： F27B14/14 ,  B01D1/02 ,  C01B33/037 ,  C22B9/02 ,  C22B9/04 ,  F27B14/04 ,  F27B14/06 ,  F27B2014/045 ,  F27D99/0006 ,  F27D2099/0008

    摘要： An objective of the present invention is, in refining a metal or a semiconductor melt, without impairing refining efficiency, to alleviate wear and tear commensurate with unevenness in a crucible caused by instability in melt flow, and to allow safe operation over long periods of time such that leakages from the crucible do not occur. Provided is a metal or semiconductor melt refining method, in which, by using an AC resistance heating heater as a crucible heating method, the melt is heat retained and mixed by a rotating magnetic field which is generated by the resistance heating heater. The metal or semiconductor melt refinement method and a vacuum refinement device which is optimal for the refinement method are characterized in that, in order that a fluid instability does not occur in the boundary between the melt and the bottom face of the crucible when the melt is rotated by the rotating magnetic field, with a kinematic viscosity coefficient of the melt designated ν (m2/sec), the radius of the fluid surface of the melt designated R (m), and the rotational angular velocity of the melt designated Ω (rad/sec), the operation is carried out such that the value of a Reynolds number (Re) which is defined as Re=R×(Ω/ν)̂(1/2) does not exceed 600.

    摘要翻译： 本发明的目的是在不损害精炼效率的同时，在精炼金属或半导体熔体的同时，减轻由熔体流动不稳定引起的坩埚中的不均匀度的磨损和撕裂，并允许长时间的安全运行 从而不会发生坩埚的泄漏。 提供一种金属或半导体熔融精炼方法，其中通过使用交流电阻加热器作为坩埚加热方法，通过由电阻加热器产生的旋转磁场将熔体热保持并混合。 金属或半导体熔体精制方法和对精制方法最佳的真空精制装置的特征在于，为了在熔体与坩埚的底面之间的边界处不会发生流体不稳定性，当熔体是 通过旋转磁场旋转，熔体的运动粘度系数指定为ngr; （m2 / sec），指定为R（m）的熔体的流体表面的半径以及指定为＆OHgr的熔体的旋转角速度; （rad / sec），进行操作，使得被定义为Re = R×（＆OHgr; /＆ngr;）（1/2）的雷诺数（Re）的值不超过600。