公开(公告)号：US20240174786A1

公开(公告)日：2024-05-30

申请号：US18551005

申请日：2022-03-25

申请人： SUMITOMO BAKELITE CO., LTD.

发明人： Taketoshi Murai ,  Yoshiyuki Go

IPC分类号： C08G8/20 ,  B24D3/28 ,  C08K5/3492

CPC分类号： C08G8/20 ,  B24D3/28 ,  C08K5/3492

摘要： A lignin-modified novolac-type phenol resin having a weight average molecular weight of equal to or more than 5500.

公开(公告)号：US20210009764A1

公开(公告)日：2021-01-14

申请号：US16770509

申请日：2018-12-07

申请人： GEORGIA-PACIFIC CHEMICALS LLC

发明人： Bobby L. WILLIAMSON ,  Copeland C. MADDIX

IPC分类号： C08H7/00 ,  C08G8/24 ,  C08G8/20 ,  C08G8/10 ,  C08L61/12 ,  C08L97/00

摘要： Aromatic alcohol-lignin-aldehyde resins and process for making and using same. In some examples, a process for making a resin can include heating a first mixture that includes a lignin, an aromatic alcohol, and a base compound to produce a second mixture that can include an activated lignin, the aromatic alcohol, and the base compound. The second mixture can be heated with an aldehyde to produce a third mixture that can include an aromatic alcohol-lignin-aldehyde resin and unreacted free aldehyde. In some examples, an aromatic alcohol-lignin-aldehyde resin can be or include a co-polymer of an activated lignin, an aromatic alcohol, and an aldehyde. A weight ratio of the activated lignin to the aromatic alcohol can be about 20:80 to about 95:5.

公开(公告)号：US10747112B2

公开(公告)日：2020-08-18

申请号：US15563263

申请日：2016-03-17

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Takumi Toida ,  Masatoshi Echigo ,  Takashi Makinoshima

IPC分类号： G03F7/11 ,  C08G8/14 ,  C07C43/23 ,  C07C39/367 ,  G03F7/038 ,  C07C37/72 ,  C07C41/38 ,  C08G8/20 ,  H01L21/027 ,  C08F32/08 ,  C08K5/00 ,  C08K5/07 ,  C08K5/09

摘要： The present invention provides a compound represented by following formula (1), wherein R1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R2 to R5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R1 to R5 represents a group including an iodine atom and at least one R4 and/or at least one R5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m2 and m3 independently represents an integer of 0 to 8, each of m4 and m5 independently represents an integer of 0 to 9, provided that m4 and m5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p2 to p5 independently represents an integer of 0 to 2.

公开(公告)号：US20200057370A1

公开(公告)日：2020-02-20

申请号：US16498306

申请日：2018-03-30

申请人： The School Corporation Kansai University ,  Mitsubishi Gas Chemical Company, Inc.

发明人： Hiroto KUDO ,  Takashi SATO ,  Masatoshi ECHIGO

IPC分类号： G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C07H13/08 ,  C07D311/62 ,  C08F122/20 ,  C08G59/32 ,  C08G8/20

摘要： A resist composition comprising one or more tannin compounds selected from the group consisting of a tannin comprising at least one crosslinking reactive group in the structure and a derivative thereof, and a resin obtained using the tannin or the derivative as a monomer.

公开(公告)号：US10520814B2

公开(公告)日：2019-12-31

申请号：US15672660

申请日：2017-08-09

申请人： JSR CORPORATION

发明人： Masayuki Miyake ,  Goji Wakamatsu ,  Tsubasa Abe ,  Kazunori Takanashi ,  Kazunori Sakai

IPC分类号： G03F7/09 ,  G03F7/40 ,  G03F7/38 ,  C08G8/20 ,  G03F7/004 ,  G03F7/11 ,  H01L21/02 ,  H01L21/027 ,  H01L21/033 ,  H01L21/768 ,  C09D161/06 ,  C09D161/12 ,  C09D161/14

摘要： A resist underlayer film-forming composition includes a solvent, and a compound comprising an aromatic ring. The solvent includes a first solvent having a normal boiling point of less than 156° C., and a second solvent having a normal boiling point of no less than 156° C. and less than 300° C. The resist underlayer film-forming composition is for use in forming a resist underlayer film to be overlaid on a patterned substrate. A production method of a patterned substrate includes applying the resist underlayer film-forming composition on a patterned substrate to obtain a coating film on the patterned substrate. The coating film is heated to obtain a resist underlayer film. A resist pattern is formed on an upper face side of the resist underlayer film. The resist underlayer film and the substrate are etched using the resist pattern as a mask.

公开(公告)号：US10414850B2

公开(公告)日：2019-09-17

申请号：US15775921

申请日：2016-11-17

申请人： DIC Corporation

发明人： Tomoyuki Imada ,  Yusuke Sato

IPC分类号： C08G8/30 ,  G03F7/039 ,  C08G8/20 ,  C08L61/12 ,  G03F7/023 ,  C08G8/04

摘要： Provided are a resin containing phenolic hydroxyl groups having excellent developability, heat resistance, and substrate followability, a photosensitive composition, a curable composition, and a resist film which contain the resin containing phenolic hydroxyl group. The resin containing phenolic hydroxyl groups obtained by reacting a novolac resin intermediate obtained by reacting a triarylmethane compound (A) with an aldehyde compound (B) as essential components, with an alkene compound (C) having 9 to 24 carbon atoms, a photosensitive composition, a curable composition, and a resist film which contain the resin containing phenolic hydroxyl groups.

公开(公告)号：US20190177585A1

公开(公告)日：2019-06-13

申请号：US16274429

申请日：2019-02-13

申请人： UPM-KYMMENE CORPORATION

发明人： Suvi PIETARINEN ,  Okko RINGENA ,  Kati OINONEN ,  Sanna VALKONEN

IPC分类号： C09J197/00 ,  C08G8/24 ,  C08L97/02 ,  C08L97/00 ,  C07G1/00 ,  C08G8/20 ,  C08H7/00 ,  C09J161/12

摘要： The present invention relates to a method for increasing the reactivity of lignin, wherein the method comprises the following steps: a) forming, under heating at a temperature of 30-70° C., an aqueous dispersion comprising alkali and lignin, wherein the alkali comprises a hydroxide of an alkali metal; and b) heating the dispersion formed in step a) at a temperature of 50-95° C. for producing alkalated lignin.

公开(公告)号：US10246619B2

公开(公告)日：2019-04-02

申请号：US15251509

申请日：2016-08-30

申请人： UPM-Kymmene Corporation

发明人： Suvi Pietarinen ,  Okko Ringena ,  Kati Eskelinen ,  Sanna Valkonen

IPC分类号： C08H7/00 ,  C09J197/00 ,  C07G1/00 ,  C08G8/20 ,  C09J161/12 ,  C08L97/00 ,  C08L97/02 ,  C08G8/24

摘要： The present invention relates to a method for increasing the reactivity of lignin, wherein the method comprises the following steps: a) forming, under heating at a temperature of 30-70° C., an aqueous dispersion comprising alkali and lignin, wherein the alkali comprises a hydroxide of an alkali metal; and b) heating the dispersion formed in step a) at a temperature of 50-95° C. for producing alkalated lignin.

公开(公告)号：US10017636B2

公开(公告)日：2018-07-10

申请号：US15257439

申请日：2016-09-06

申请人： UPM-Kymmene Corporation

发明人： Sanna Valkonen ,  Suvi Pietarinen ,  Okko Ringena ,  Kati Oinonen

IPC分类号： C08L61/06 ,  C08H7/00 ,  C08G8/20 ,  C09J161/12 ,  C09J197/00 ,  C08L97/00 ,  C08L97/02 ,  C08G8/24 ,  C09J5/00 ,  C09J161/06 ,  B27D1/04

摘要： The present invention relates to a method for producing a binder composition, wherein the method comprises the following steps: (i) forming an aqueous composition comprising reactant components including lignin molecules of 11-60 lignin units, lignin molecules of 1-10 lignin units, polymerizable substance and crosslinking agent in the presence of a catalyst; and (ii) cooking the composition at a temperature of 60-95° C. for polymerizing the reactant components until a binder composition with a predetermined viscosity value is formed.

公开(公告)号：US09809523B2

公开(公告)日：2017-11-07

申请号：US15122324

申请日：2015-02-27

申请人： UNIVERSITE PARIS-SUD XI ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

发明人： Vincent Germain Huc ,  Cyril Martini

IPC分类号： C07C41/30 ,  C07C41/34 ,  C08G8/00 ,  C07C67/14 ,  C07C41/40 ,  C08G8/20 ,  C08G8/28 ,  C08G83/00

CPC分类号： C07C41/30 ,  C07C41/34 ,  C07C41/40 ,  C07C67/14 ,  C07C2603/92 ,  C08G8/20 ,  C08G8/28 ,  C08G83/005 ,  C08G2105/00 ,  C07C43/23 ,  C07C69/63

摘要： A process for the high-yield preparation of p-(R)calix[9-20]arenes.