Positive-working radiation-sensitive mixture
    1.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号:US5843319A

    公开(公告)日:1998-12-01

    申请号:US902072

    申请日:1997-07-29

    CPC分类号: G03F7/0045 G03F7/039

    摘要: A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl; Y represents (CH.sub.2).sub.n (wherein n is 0 or 1), O or S; R.sup.8 and R.sup.9 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; R.sup.10 and R.sup.11 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; n is 5 or 6; and X.sub.2.sup.- represents a basic anion having a pK.sub.B value of -3 to +5; comprising the steps of: (a) dissolving a sulfonium salt (B) in a metal-ion free polar or non-polar solvent to form a solution, said sulfonium salt (B) being selected from said formulae II-V, wherein R.sup.5 to R.sup.11, Y and n of said sulfonium salt (B) have the sane meaning as above and X.sub.2.sup.- represents a non-nucleophilic anion; (b) contacting said solution for a sufficient amount of time with a basic ion-exchange resin having a quaternary ammonium group to replace the anion of (B) with a hydroxide ion and to form a sulfonium hydroxide solution; (c) separating said sulfonium hydroxide solution from the resin; and optionally (d) adding an active hydrogen containing compound or its base-labile precursor to said sulfonium hydroxide solution to yield a solution of the sulfonium compound (A) wherein X.sub.2.sup.- represents a basic anion other than a hydroxy ion.

    摘要翻译: 制备式II-V的碱性或非碱性锍化合物(A)的溶液的方法:[SR5R6R7] + X2-Ⅱ其中R5,R6和R7各自独立地 独立地表示C1-C18烷基,芳基或杂芳基或被烷基,烷基芳基,芳基,卤素,烷氧基,苯氧基,苯硫酚,苯基磺酰基或苯基磺酰基单 - ,二 - 或三 - 取代的芳基 苯基磺酰基; Y表示(CH 2)n(其中n为0或1),O或S; R8和R9代表C1-C4烷基,烷氧基或卤素; R10和R11表示C1-C4烷基,烷氧基或卤素; n为5或6; X2-表示pKB值为-3〜+5的碱性阴离子; 包括以下步骤:(a)将锍盐(B)溶解在无金属离子的极性或非极性溶剂中以形成溶液,所述锍盐(B)选自所述式II-V,其中R5至 所述锍盐(B)的R 11,Y和n具有如上所述的正义,X2-表示非亲核阴离子; (b)用具有季铵基团的碱性离子交换树脂将所述溶液接触足够的时间以用氢氧根离子代替(B)的阴离子并形成氢氧化锍溶液; (c)从树脂中分离出氢氧化锍溶液; 和任选地(d)在所述氢氧化锍溶液中加入含活性氢的化合物或其碱不稳定的前体,得到其中X2代表羟基离子以外的碱性阴离子的锍化合物(A)的溶液。