Method for cleaning gas containing toxic component
    1.
    发明授权
    Method for cleaning gas containing toxic component 失效
    清洁含有毒成分的气体的方法

    公开(公告)号:US4910001A

    公开(公告)日:1990-03-20

    申请号:US238068

    申请日:1988-08-30

    IPC分类号: B01D53/46

    CPC分类号: B01D53/46

    摘要: A method for cleaning a gas containing at least one toxic component selected from the group consisting of arsine, phosphine, monosilane, diborane, and hydrogen selenide, which comprises contacting the gas with a cleaning agent containing a molded composition comprising (1) manganese dioxide and (2) cupric oxide, having deposited thereon (3) a silver compound, wherein the weight ratio of cupric oxide to manganese dioxide ranges from 0.2 to 1.2 and the amount of the deposited silver compound ranges from 0.01 to 10.5% by weight based on the cleaning agent. By the cleaning method, the toxic component can be removed from a gas, e.g., air, at high efficiency and at a high rate even in case of sudden leakage of the toxic component out of a bomb.

    Process and apparatus for cleaning exhaust gas
    4.
    发明授权
    Process and apparatus for cleaning exhaust gas 失效
    废气净化工艺及设备

    公开(公告)号:US06331281B1

    公开(公告)日:2001-12-18

    申请号:US09414348

    申请日:1999-10-07

    IPC分类号: B01D5358

    CPC分类号: B01D53/8634 Y02A50/2346

    摘要: There are disclosed a process for cleaning ammonia-containing exhaust gas which comprises bringing the exhaust gas into contact with an ammonia decomposition catalyst (e.g. nickel, ruthenium) under heating to decompose most of the ammonia into nitrogen and hydrogen, subsequently bringing the resultant mixed gas into contact with an ammonia adsorbent (e.g. synthetic zeolite) for adsorbing undecomposed ammonia, and then heating regenerating the adsorbent, while bringing reproduced exhaust gas containing the ammonia desorbed from the adsorbent into contact under heating, with the ammonia decomposition catalyst or another ammonia decomposition catalyst; and an apparatus for carrying out the process. It is made possible by the process and apparatus to efficiently and completely clean ammonia-containing exhaust gas exhausted from a semiconductor manufacturing process and the like without generating useless byproduct and dispensing with secondary treatment.

    摘要翻译: 公开了一种清洗含氨废气的方法,该方法包括在加热下将废气与氨分解催化剂(例如镍,钌)接触以将大部分氨分解成氮和氢,随后将所得混合气体 与用于吸附未分解氨的氨吸附剂(例如合成沸石)接触,然后加热再生吸附剂,同时使含有从吸附剂解吸的氨的再生废气与加热下的氨分解催化剂或另一种氨分解催化剂接触 ; 以及用于执行该过程的装置。 通过该方法和装置可以有效且完全地清洁从半导体制造工艺等排出的含氨废气,而不会产生无用的副产物和分配二次处理。

    Process for cleaning harmful gas
    5.
    发明授权
    Process for cleaning harmful gas 失效
    清洁有害气体的过程

    公开(公告)号:US5597540A

    公开(公告)日:1997-01-28

    申请号:US308648

    申请日:1994-09-19

    IPC分类号: B01D53/68 C01B7/07

    CPC分类号: B01D53/68

    摘要: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process.

    摘要翻译: 公开了一种清洁有害气体的方法,该方法包括使氯,氯化氢,二氯硅烷,四氯化硅,三氯化磷,三氟化氯,三氯化硼,三氟化硼,六氟化钨,四氟化硅,氟,氢等有害的气态卤化物 氟化物和溴化氢与包含氧化锌,氧化铝和碱性化合物的清洗剂接触以除去上述卤化物。 上述方法对于迅速有效地除去从半导体制造过程中排出的气体中所含有的上述气态卤化物是非常有效的。

    Process for cleaning harmful gas
    6.
    发明授权
    Process for cleaning harmful gas 失效
    清洁有害气体的过程

    公开(公告)号:US5378444A

    公开(公告)日:1995-01-03

    申请号:US975698

    申请日:1992-11-13

    IPC分类号: B01D53/68 C01B7/07

    CPC分类号: B01D53/68

    摘要: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.

    摘要翻译: 公开了一种清洁有害气体的方法,该方法包括使氯,氯化氢,二氯硅烷,四氯化硅,三氯化磷,三氟化氯,三氯化硼,三氟化硼,六氟化钨,四氟化硅,氟,氢等有害的气态卤化物 氟化物和溴化氢与包含氧化锌,氧化铝和碱性化合物的清洗剂接触以除去上述卤化物。 上述过程对于迅速有效地除去在半导体制造过程中排出的气体中所含的上述气态卤化物或在紧急情况下突然从气体炸弹泄漏而非常有效。

    Method for cleaning exhaust gases
    7.
    发明授权
    Method for cleaning exhaust gases 失效
    排气净化方法

    公开(公告)号:US4743435A

    公开(公告)日:1988-05-10

    申请号:US711135

    申请日:1985-03-13

    摘要: A method for cleaning an exhaust gas containing at least one toxic component selected from the group consisting of arsine, phosphine, diborane and hydrogen selenide is disclosed. The method comprises contacting the toxic component with a molded cleaning agent having a composition consisting essentially of (1) cupric oxide and (2) at least one metal oxide selected from the group consisting of silicon oxide, aluminum oxide and zinc oxide and having a density of from about 1.5 to about 3.5 g/ml, said composition having a metal atomic ratio M/(M+Cu) in the range of from about 0.02 to about 0.7 wherein Cu represents a number of gram atom of copper and M represents a total number of gram atom of silicon, aluminum and/or zinc, to remove the toxic component from the exhaust gas.

    摘要翻译: 公开了一种清洗含有选自胂,膦,乙硼烷和硒化氢中的至少一种有毒成分的废气的方法。 该方法包括使有毒成分与具有以下组成的成型清洗剂接触:(1)氧化铜和(2)选自氧化硅,氧化铝和氧化锌中的至少一种金属氧化物,并具有密度 为约1.5至约3.5g / ml,所述组合物的金属原子比M /(M + Cu)在约0.02至约0.7的范围内,其中Cu表示铜原子数,M表示总量 硅,铝和/或锌的克原子数,以从废气中除去有毒成分。

    Method for detecting gaseous hydrides
    9.
    发明授权
    Method for detecting gaseous hydrides 失效
    检测气态氢化物的方法

    公开(公告)号:US4731333A

    公开(公告)日:1988-03-15

    申请号:US878537

    申请日:1986-06-25

    IPC分类号: G01N31/00 G01N31/22 G01N21/78

    摘要: A solid detecting reagent for gaseous hydrides and a gaseous hydride detecting method are disclosed, said reagent comprising a basic copper carbonate as a color changing component and undergoing color change upon contact with at least one gaseous hydride selected from the group consisting of arsine, phosphine, diborane, hydrogen selenide, germane, monosilane, disilane and dichlorosilane. The reagent is applicable to all of these gaseous hydrides and, upon contact therewith, rapidly changes from an initial blue color to a black color, said black color standing for a long period of time.

    摘要翻译: 公开了一种用于气态氢化物的固体检测试剂和气态氢化物检测方法,所述试剂包含碱性碳酸铜作为变色组分,并且与至少一种选自胂,膦, 乙硼烷,硒化氢,锗烷,甲硅烷,乙硅烷和二氯硅烷。 该试剂适用于所有这些气态氢化物,并且与其接触时,从初始蓝色迅速变化为黑色,所述黑色长时间放置。