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公开(公告)号：US11602742B2
公开(公告)日：2023-03-14
申请号：US17178336
申请日：2021-02-18
申请人： Koji Sugiura , Hiromasa Nishioka , Naoto Miyoshi , Akemi Sato , Ryota Nakashima , Masatoshi Ikebe , Keisuke Murawaki , Hirotaka Ori
发明人： Koji Sugiura , Hiromasa Nishioka , Naoto Miyoshi , Akemi Sato , Ryota Nakashima , Masatoshi Ikebe , Keisuke Murawaki , Hirotaka Ori
IPC分类号： B01J23/40 , B01J23/42 , B01J23/44 , B01J23/46 , B01J35/00 , B01J35/04 , B01D53/94 , B01D46/24 , F01N3/28
摘要： Provided is an exhaust gas purification device that ensures an improved purification performance and a suppressed pressure loss. An exhaust gas purification device of the present disclosure includes a honeycomb substrate and an inflow cell side catalyst layer. disposed on a surface on the inflow cell side in an inflow side region of the partition wall. When a gas permeability coefficient of an inflow side partition wall portion including the inflow side region of the partition wall and the inflow cell side catalyst layer is Ka and a gas permeability coefficient of an outflow side partition wall portion including an outflow side region at least from the predetermined position to an outflow side end of the partition wall is Kb, a ratio Ka/Kb of the gas permeability coefficients is within a range of 0.4 or more and 0.8 or less.
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公开(公告)号：US11660589B2
公开(公告)日：2023-05-30
申请号：US16864340
申请日：2020-05-01
申请人： Koji Sugiura , Hiromasa Nishioka , Naoto Miyoshi , Akemi Sato , Masatoshi Ikebe , Ryota Nakashima , Yasutaka Nomura , Hirotaka Ori
发明人： Koji Sugiura , Hiromasa Nishioka , Naoto Miyoshi , Akemi Sato , Masatoshi Ikebe , Ryota Nakashima , Yasutaka Nomura , Hirotaka Ori
CPC分类号： B01J35/04 , B01D46/2418 , B01D53/94 , B01J23/42 , B01J23/44 , B01J23/464 , F01N3/0821 , F01N3/281 , B01D2255/1021 , B01D2255/1023 , B01D2255/1025 , B01D2255/9155
摘要： An exhaust gas purification device that allows suppressing an increase in pressure loss is provided. The exhaust gas purification device of the present disclosure includes a honeycomb substrate and an inflow cell side catalyst layer. The substrate includes a porous partition wall which defines inflow cells and outflow cells extending from an inflow side end to an outflow side end. The inflow cell side catalyst layer is disposed on a surface on the inflow cell side in an inflow cell side catalyst region from an inflow side end to a position close to an outflow side end of the partition wall. The permeability of a portion including an outflow side region from the position to the outflow side end of the partition wall is higher than a gas permeability of a portion including the inflow cell side catalyst region of the partition wall and the inflow cell side catalyst layer.
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公开(公告)号：US11415039B2
公开(公告)日：2022-08-16
申请号：US16851169
申请日：2020-04-17
申请人： Koji Sugiura , Hiromasa Nishioka , Naoto Miyoshi , Akemi Sato , Masatoshi Ikebe , Ryota Nakashima , Yasutaka Nomura
发明人： Koji Sugiura , Hiromasa Nishioka , Naoto Miyoshi , Akemi Sato , Masatoshi Ikebe , Ryota Nakashima , Yasutaka Nomura
摘要： There is provided a structure including: a substrate including a first and a second ends, and a porous partition wall defining a first and a second cells extending between the first and the second ends; a first catalyst; and a second catalyst. In a first area, the first catalyst is disposed on a first surface of the partition wall, and the partition wall with the first catalyst disposed on the partition wall is impermeable to gas. In a second area, the first catalyst is not provided, the second catalyst is disposed in a region including at least a part inside the partition wall, the part facing the first cell, and the partition wall with the second catalyst disposed in the partition wall is permeable to gas. In a third area, any of the first catalyst or the second catalyst is not provided, and the partition wall is permeable to gas.
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公开(公告)号：US11679379B2
公开(公告)日：2023-06-20
申请号：US17734702
申请日：2022-05-02
申请人： Koji Sugiura , Takeshi Hirabayashi , Akemi Satou , Keisuke Murawaki , Takaya Ota , Masatoshi Ikebe , Kohei Takasaki , Takeshi Morishima
发明人： Koji Sugiura , Takeshi Hirabayashi , Akemi Satou , Keisuke Murawaki , Takaya Ota , Masatoshi Ikebe , Kohei Takasaki , Takeshi Morishima
CPC分类号： B01J35/0006 , B01D53/94 , B01J35/04 , F01N3/2828 , B01D2255/1021 , B01D2255/1025 , B01D2255/407 , B01D2255/9022 , B01D2255/9205 , F01N2330/06 , F01N2330/48 , F01N2370/02 , F01N2510/06
摘要： The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.
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