摘要:
The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.
摘要:
An exhaust gas purification catalyst includes: a lower catalyst layer that contains a ceria-zirconia mixed oxide having 50 to 70 mass % of CeO2 and 5 mass % or more of Pr2O3 and carries at least one of Pt and Pd; and an upper catalyst layer that contains at least zirconia and carries at least Rh, wherein the total amount of CeO2 per liter of the carrier base is 15 to 30 g. Because the amount of CeO2 is small, formation of H2S is suppressed and a high capability of adsorbing and releasing oxygen is brought out in spite of the small amount of CeO2.
摘要:
The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.
摘要:
There is provided an exhaust gas purification device that shows a high HC removal performance under a condition in which a rich air-fuel mixture is introduced. The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end and a downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region including the upstream end of the substrate. The second catalyst layer is disposed inside the partition wall in a downstream region including the downstream end of the substrate. The first catalyst layer contains a first metal catalyst and alumina-zirconia composite oxide. The second catalyst layer contains a second metal catalyst.
摘要:
There is provided an exhaust gas purification device that shows a high HC removal performance under a condition in which a rich air-fuel mixture is introduced. The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end and a downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region including the upstream end of the substrate. The second catalyst layer is disposed inside the partition wall in a downstream region including the downstream end of the substrate. The first catalyst layer contains a first metal catalyst and alumina-zirconia composite oxide. The second catalyst layer contains a second metal catalyst.
摘要:
An exhaust gas purification catalyst includes: a lower catalyst layer that contains a ceria-zirconia mixed oxide having 50 to 70 mass % of CeO2 and 5 mass % or more of Pr2O3 and carries at least one of Pt and Pd; and an upper catalyst layer that contains at least zirconia and carries at least Rh, wherein the total amount of CeO2 per liter of the carrier base is 15 to 30 g. Because the amount of CeO2 is small, formation of H2S is suppressed and a high capability of adsorbing and releasing oxygen is brought out in spite of the small amount of CeO2.
摘要:
A full-fat soybean flour-containing composition which is capable of improving flavor and texture of foods by using as a substitute for a part or the entirety of a basic ingredient of a food, or by additionally using as a novel basic ingredient, and a food prepared using the same are provided. In addition, an egg substitute composition which can be used in a food as an egg substitute and which contains a full-fat soybean flour as a principal component, and a food prepared using the same are provided. The full-fat soybean flour-containing composition of the present invention contains a full-fat soybean flour, a plant protein, an emulsifying agent, and a masking agent. Moreover, the egg substitute composition of the present invention contains a full-fat soybean flour, a plant protein, an emulsifying agent, and a masking agent, and can be used in a food as an egg substitute.