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公开(公告)号:US5518552A
公开(公告)日:1996-05-21
申请号:US267542
申请日:1994-06-29
申请人: Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
发明人: Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
CPC分类号: H01L21/67051 , G02F1/1333 , H01L21/67046
摘要: A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.
摘要翻译: 衬底洗涤和清洁方法,其中衬底被携带到可旋转的擦洗装置,并且衬底的两个表面被基本保持基本水平的可旋转洗涤装置擦洗。 此外,在衬底基本上水平并且被线性往复运动的同时,将清洁溶液施加到衬底的两个表面。
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公开(公告)号:US5345639A
公开(公告)日:1994-09-13
申请号:US69106
申请日:1993-05-28
申请人: Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
发明人: Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
IPC分类号: G02F1/1333 , H01L21/00 , A46B13/04
CPC分类号: H01L21/67051 , G02F1/1333 , H01L21/67046
摘要: A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.
摘要翻译: 一种基板洗涤和清洁装置,包括具有用于洗涤LCD玻璃基板的两个表面的上部和下部刷构件的机构,用于旋转上部和下部刷构件的机构,用于向上部和下部刷子提供纯水的机构 构件,用于在基板传送方向上相对于上刷毛构件和下刷构件在上刷毛构件和下刷构件之间承载衬底往复运动的机构,以及用于控制衬底承载机构的操作的控制器。
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