公开(公告)号：US06261007B1

公开(公告)日：2001-07-17

申请号：US09362860

申请日：1999-07-29

申请人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Mitsuhiro Sakai ,  Shinobu Tanaka ,  Yoichi Honda ,  Yuji Shimomura

发明人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Mitsuhiro Sakai ,  Shinobu Tanaka ,  Yoichi Honda ,  Yuji Shimomura

IPC分类号： G03D500

CPC分类号： H01L21/6715 ,  G03F7/168 ,  H01L21/67034

摘要： Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.

摘要翻译： 刚刚将抗蚀剂溶液涂覆在基材上之后，其基本处于非加热状态。 实际上，惯性气体等从喷头吹送到基板。 因此，涂布在基板上的抗蚀剂溶液被干燥。 因此，可以防止导致抗蚀剂膜的膜厚度不均匀的转印标记和电路图案的线宽波动。

公开(公告)号：US5518552A

公开(公告)日：1996-05-21

申请号：US267542

申请日：1994-06-29

申请人： Kouichi Tanoue ,  Shinzi Kitamura ,  Noriyuki Anai ,  Takami Satoh ,  Takayuki Tomoeda ,  Tatsuya Iwasaki ,  Kengo Mizosaki

发明人： Kouichi Tanoue ,  Shinzi Kitamura ,  Noriyuki Anai ,  Takami Satoh ,  Takayuki Tomoeda ,  Tatsuya Iwasaki ,  Kengo Mizosaki

IPC分类号： G02F1/1333 ,  H01L21/00 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  B08B7/02

CPC分类号： H01L21/67051 ,  G02F1/1333 ,  H01L21/67046

摘要： A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.

摘要翻译： 衬底洗涤和清洁方法，其中衬底被携带到可旋转的擦洗装置，并且衬底的两个表面被基本保持基本水平的可旋转洗涤装置擦洗。 此外，在衬底基本上水平并且被线性往复运动的同时，将清洁溶液施加到衬底的两个表面。

公开(公告)号：US5998766A

公开(公告)日：1999-12-07

申请号：US791617

申请日：1997-01-31

申请人： Kengo Mizosaki ,  Masaaki Yoshida

发明人： Kengo Mizosaki ,  Masaaki Yoshida

IPC分类号： G03F7/38 ,  B05D1/40 ,  B08B7/00 ,  G03F7/16 ,  H01L21/027 ,  H01L21/304 ,  F27B5/14

CPC分类号： G03F7/16 ,  B08B7/0057

摘要： This invention relates to a processing apparatus having an object holding means for holding an object to be processed, a processing chamber for housing the object to be processed and the object holding means, an ultraviolet irradiation means for irradiating ultraviolet rays on the object to be processed, an ultraviolet irradiation means chamber incorporating the ultraviolet irradiation means, an opening/closing means for opening/closing an opening for allowing the processing chamber to communicate with the ultraviolet irradiation means chamber, a first exhaust means for exhausting ozone which is produced upon irradiation of the ultraviolet ray by the ultraviolet irradiation means and present in the processing chamber, and a second exhaust means for exhausting ozone produced in the ultraviolet irradiation means chamber, and a processing method using the same.

摘要翻译： 本发明涉及一种具有用于保持待处理物体的物体保持装置，用于容纳待处理物体的处理室和物体保持装置的处理装置，用于向被处理物体照射紫外线的紫外线照射装置 ，包含紫外线照射装置的紫外线照射装置室，用于打开/关闭用于允许处理室与紫外线照射装置室连通的开口的打开/关闭装置，用于排出在照射时产生的臭氧的第一排气装置 通过紫外线照射装置的紫外线存在于处理室中，以及用于排出在紫外线照射装置室中产生的臭氧的第二排气装置及使用其的处理方法。

公开(公告)号：US5345639A

公开(公告)日：1994-09-13

申请号：US69106

申请日：1993-05-28

申请人： Kouichi Tanoue ,  Shinzi Kitamura ,  Noriyuki Anai ,  Takami Satoh ,  Takayuki Tomoeda ,  Tatsuya Iwasaki ,  Kengo Mizosaki

发明人： Kouichi Tanoue ,  Shinzi Kitamura ,  Noriyuki Anai ,  Takami Satoh ,  Takayuki Tomoeda ,  Tatsuya Iwasaki ,  Kengo Mizosaki

IPC分类号： G02F1/1333 ,  H01L21/00 ,  A46B13/04

CPC分类号： H01L21/67051 ,  G02F1/1333 ,  H01L21/67046

摘要： A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

摘要翻译： 一种基板洗涤和清洁装置，包括具有用于洗涤LCD玻璃基板的两个表面的上部和下部刷构件的机构，用于旋转上部和下部刷构件的机构，用于向上部和下部刷子提供纯水的机构 构件，用于在基板传送方向上相对于上刷毛构件和下刷构件在上刷毛构件和下刷构件之间承载衬底往复运动的机构，以及用于控制衬底承载机构的操作的控制器。

公开(公告)号：US06451515B2

公开(公告)日：2002-09-17

申请号：US09366960

申请日：1999-08-04

申请人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Yoshitaka Matsuda

发明人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Yoshitaka Matsuda

IPC分类号： G03F738

CPC分类号： B05D3/0209 ,  B05D1/005 ,  G03F7/168

摘要： A substrate coated with a coating solution, for example, a resist solution is heated at a predetermined temperature, thereafter putted in a non-heated state, and then heated at a second predetermined temperature. Alternatively, a heating process in which a substrate coated with a resist solution is heated and a non-heated process in which the substrate is putted in a non-heated state are repeated a plurality of times. The adoption of the above treating methods can prevent the occurrence of transfer which is an index of ununiformity of film thickness of a resist solution and the like and change in line width of a circuit pattern, thus improving yield in substrate treatment.

公开(公告)号：US06443641B2

公开(公告)日：2002-09-03

申请号：US09874259

申请日：2001-06-06

申请人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Mitsuhiro Sakai ,  Shinobu Tanaka ,  Yoichi Honda ,  Yuji Shimomura

发明人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Mitsuhiro Sakai ,  Shinobu Tanaka ,  Yoichi Honda ,  Yuji Shimomura

IPC分类号： G03D500

CPC分类号： H01L21/6715 ,  G03F7/168 ,  H01L21/67034

摘要： Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.

摘要翻译： 刚刚将抗蚀剂溶液涂覆在基材上之后，其基本处于非加热状态。 实际上，惯性气体等从喷头吹送到基板。 因此，涂布在基板上的抗蚀剂溶液被干燥。 因此，可以防止导致抗蚀剂膜的膜厚度不均匀的转印标记和电路图案的线宽波动。

公开(公告)号：US6087632A

公开(公告)日：2000-07-11

申请号：US227874

申请日：1999-01-11

申请人： Kengo Mizosaki ,  Masaaki Yoshida

发明人： Kengo Mizosaki ,  Masaaki Yoshida

IPC分类号： H01L21/00 ,  H01L21/27 ,  H01L21/324

CPC分类号： H01L21/67115

摘要： A heat processing device includes a hot plate on which a substrate is placed, a heater press-fitted in the hot plate for heating the substrate through the hot plate, and a reflecting plate facing an underside and side faces of the hot plate at a distance therefrom for reflecting heat radiated from the hot plate. An outside frame is arranged on the surface of the hot plate so as to surround the substrate.

摘要翻译： 热处理装置包括其上放置有基板的加热板，压入加热板中的用于通过加热板加热基板的加热器和远离热板的下侧和侧面的反射板 用于反射从热板辐射的热量。 外部框架布置在热板的表面上以包围基板。

公开(公告)号：US5695562A

公开(公告)日：1997-12-09

申请号：US527336

申请日：1995-09-12

申请人： Kengo Mizosaki

发明人： Kengo Mizosaki

IPC分类号： B65G49/07 ,  H01L21/027 ,  H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  H01L21/683 ,  B05C11/00

CPC分类号： H01L21/67778

摘要： A processing apparatus comprises a carrier rest portion for placing thereon carriers each of which stores a plurality of plate-like target bodies substantially horizontally with gaps therebetween in the vertical direction and which has a front surface forming a target body transfer port and a side surface having a light-transmitting portion, a convey mechanism having a target body holding member which is movable back and forth and movable vertically relative to the carrier rest portion to sequentially extract and transfer target bodies in the carrier to a processing unit, and photocoupler and a mirror, provided to the convey mechanism to oppose each other through part of the target body in the horizontal direction, for detecting presence/absence of a target body in each stage of the carrier on the carrier rest portion.

摘要翻译： 一种处理装置，其特征在于，具备：托架托架，用于放置托架，托架各自在垂直方向上基本上水平地存储有多个板状的目标体，并具有形成目标体传送口的前表面， 透光部分，具有目标体保持部件的传送机构，所述目标体保持部件可前后移动并相对于所述托架部分垂直移动，以顺序地将所述载体中的目标物体提取并传送到处理单元，以及光电耦合器和反射镜 提供给传送机构以在水平方向上通过目标体的一部分彼此相对，用于检测载体搁架部分上的载体的各个阶段中的目标体的存在/不存在。