公开(公告)号：US06444409B1

公开(公告)日：2002-09-03

申请号：US09875022

申请日：2001-06-07

申请人： Shinichiro Araki ,  Shinko Matsumoto ,  Noriyuki Anai

发明人： Shinichiro Araki ,  Shinko Matsumoto ,  Noriyuki Anai

IPC分类号： G03F716

摘要： A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.

公开(公告)号：US06270576B1

公开(公告)日：2001-08-07

申请号：US09365782

申请日：1999-08-03

申请人： Shinichiro Araki ,  Shinko Matsumoto ,  Noriyuki Anai

发明人： Shinichiro Araki ,  Shinko Matsumoto ,  Noriyuki Anai

IPC分类号： G02B520

CPC分类号： H01L21/6715 ,  B05C11/08 ,  G02B5/201 ,  G03F7/0007 ,  G03F7/162 ,  G03F7/3021 ,  Y10S430/136

摘要： A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.

摘要翻译： 一种涂覆和显影装置，用于用多种着色剂涂覆基材并在曝光后将其显影，包括：用于洗涤基材的洗涤单元; 涂覆单元，具有多个抗蚀剂排出喷嘴，用于分别在洗涤的基板上排出多个着色抗蚀剂; 以及显影单元，用于在曝光之后显影涂有彩色抗蚀剂的基材。 因此，可以实现装置的尺寸的减小和空间的节省，并且还可以降低制造成本。

公开(公告)号：US5887604A

公开(公告)日：1999-03-30

申请号：US743836

申请日：1996-11-05

申请人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

摘要翻译： 本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。 该室具有开口，设计用于清洗从外部通过开口运送的物体。 打开/关闭机构设计成打开和关闭洗涤室的开口。 喷嘴用于清洗打开/关闭机构。 该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当洗涤液从洗涤液中排出时，当物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上 船只。

公开(公告)号：US5688322A

公开(公告)日：1997-11-18

申请号：US653341

申请日：1996-05-24

申请人： Kimio Motoda ,  Kiyohisa Tateyama ,  Noriyuki Anai

发明人： Kimio Motoda ,  Kiyohisa Tateyama ,  Noriyuki Anai

IPC分类号： B05C11/08 ,  G03F7/16 ,  B05C5/00

CPC分类号： G03F7/162 ,  B05C11/08

摘要： Disclosed is an apparatus for coating resist comprising a spin-chuck capable of moving vertically, holding a substrate received and rotating together with the substrate, resist solution supplying mean for supplying a resist solution onto a substrate held on the spin-chuck, a rotating cup surrounding the substrate held on the spin-chuck and rotated in synchronism with the spin-chuck, for receiving the resist solution centrifugally separated from the substrate, a drain cup provided around the rotating cup, for receiving a waste material discharged from the rotating cup, the drain cup having a collecting space for collecting the waste material received, a drainage passage having a drainage port opening into the collecting space for discharging a liquid component of the waste material collected in the collecting space therefrom, an exhaust passage having an exhaust port communicating with the collecting space, for discharging a gas component of the waste material collected in the collecting space therefrom, an exhaust gas guiding passage provided at a level higher than at least the drainage port, for guiding the gas component from the collecting space to the exhaust passage, and a gas-liquid separating member provided in the exhaust gas guiding passage, for condensing a liquid component contained in air containing the gas component by striking it against the gas-liquid separating member, thereby preventing the liquid component from going around the exhaust passage.

摘要翻译： 公开了一种涂覆抗蚀剂的装置，包括能够垂直移动的旋转卡盘，保持与基板一起容纳和旋转的基板，用于将抗蚀剂溶液供应到保持在旋转卡盘上的基板上的抗蚀剂溶液供应装置，旋转杯 围绕保持在旋转卡盘上的基板并与旋转卡盘同步旋转，用于接收从基板离心分离的抗蚀剂溶液;设置在旋转杯周围的用于接收从旋转杯排出的废料的排液杯， 所述排水杯具有用于收集所接收的废料的收集空间，排水通道，具有通向所述收集空间的排出口，用于排出收集在所述收集空间中的废料的液体成分;排气通道， 具有收集空间，用于排出收集在集合体中的废料的气体成分 g的空气引导通道，排气导引通道，其设置在比至少所述排水口高的位置，用于将气体成分从收集空间引导到排气通道;以及气体分离部件，设置在排气引导通道中， 用于通过将包含在气体成分的空气中的液体成分撞击气液分离部件而冷凝，从而防止液体成分绕排气通路。

公开(公告)号：US06261007B1

公开(公告)日：2001-07-17

申请号：US09362860

申请日：1999-07-29

申请人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Mitsuhiro Sakai ,  Shinobu Tanaka ,  Yoichi Honda ,  Yuji Shimomura

发明人： Hideyuki Takamori ,  Kiyohisa Tateyama ,  Kengo Mizosaki ,  Noriyuki Anai ,  Mitsuhiro Sakai ,  Shinobu Tanaka ,  Yoichi Honda ,  Yuji Shimomura

IPC分类号： G03D500

CPC分类号： H01L21/6715 ,  G03F7/168 ,  H01L21/67034

摘要： Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.

摘要翻译： 刚刚将抗蚀剂溶液涂覆在基材上之后，其基本处于非加热状态。 实际上，惯性气体等从喷头吹送到基板。 因此，涂布在基板上的抗蚀剂溶液被干燥。 因此，可以防止导致抗蚀剂膜的膜厚度不均匀的转印标记和电路图案的线宽波动。

公开(公告)号：US5782990A

公开(公告)日：1998-07-21

申请号：US789537

申请日：1997-01-27

申请人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： A washing method for washing objects includes the steps of supplying a washing liquid to a washing vessel and immersing objects in the washing liquid contained in the washing vessel. The method also includes the steps of discharging the liquid at least once from the washing vessel, and starting to apply the washing liquid to the objects when the objects are partly exposed to air as the liquid is discharged from the washing vessel. The washing liquid application is continued during exposure of the objects to the air to prevent the surface of the objects from being dried and stained.

摘要翻译： 用于清洗物体的清洗方法包括以下步骤：将洗涤液体供应到洗涤容器中，并将物品浸入容纳在洗涤容器中的洗涤液体中。 该方法还包括以下步骤：从洗涤容器排出至少一次液体，并且当液体从洗涤容器中排出时，当物体部分暴露在空气中时，开始将洗涤液施加到物体上。 在将物体暴露于空气中期间继续洗涤液体的应用，以防止物体的表面被干燥和染色。

公开(公告)号：US5671764A

公开(公告)日：1997-09-30

申请号：US560708

申请日：1995-11-20

申请人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677 ,  B08B15/00

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

摘要翻译： 本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。 该室具有开口，设计用于清洗从外部通过开口运送的物体。 打开/关闭机构设计成打开和关闭洗涤室的开口。 喷嘴用于清洗打开/关闭机构。 该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当清洗液体从洗涤液中排出时物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上 船只。

公开(公告)号：US06635113B2

公开(公告)日：2003-10-21

申请号：US09313860

申请日：1999-05-18

申请人： Hideyuki Takamori ,  Noriyuki Anai ,  Masafumi Nomura ,  Kiyohisa Tateyama ,  Tsutae Omori

发明人： Hideyuki Takamori ,  Noriyuki Anai ,  Masafumi Nomura ,  Kiyohisa Tateyama ,  Tsutae Omori

IPC分类号： B05C1110

CPC分类号： H01L21/6715

摘要： A substrate is held on a spin chuck, and resist solution is supplied to the surface of the substrate at a plurality of positions spaced at predetermined intervals from a plurality of resist nozzles provided the bottom surface of a resist pipe provided over a first direction across the surface of the substrate. Thereafter, the substrate is oscillated or rotated, thereby making the resist solution on the substrate a thin coating film with a uniform thickness. In the coating apparatus and method, which are excellent in responsiveness to a degree of viscosity of coating solution, various kinds of treatment agents with a wide range of viscosity can be used, and mechanical accuracy such as the space between the nozzles and the substrate, accuracy of the nozzle size, and the like can be loosened.

摘要翻译： 将基板保持在旋转卡盘上，并且将抗蚀剂溶液以多个位置间隔开的多个位置从多个抗蚀剂喷嘴供应到基板的表面，所述多个抗蚀剂喷嘴设置在沿着第一方向设置的抗蚀剂管的底表面 基板的表面。 此后，基板振荡或旋转，从而使抗蚀剂溶液在基板上具有均匀厚度的薄涂层膜。 在对涂布液的粘度的响应性优异的涂布装置和方法中，可以使用具有宽范围粘度的各种处理剂，并且可以使用诸如喷嘴和基板之间的空间的机械精度， 可以使喷嘴尺寸的精度等松动。

公开(公告)号：US5488964A

公开(公告)日：1996-02-06

申请号：US880068

申请日：1992-05-07

申请人： Shinya Murakami ,  Yuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

公开(公告)号：US5345639A

公开(公告)日：1994-09-13

申请号：US69106

申请日：1993-05-28

申请人： Kouichi Tanoue ,  Shinzi Kitamura ,  Noriyuki Anai ,  Takami Satoh ,  Takayuki Tomoeda ,  Tatsuya Iwasaki ,  Kengo Mizosaki

发明人： Kouichi Tanoue ,  Shinzi Kitamura ,  Noriyuki Anai ,  Takami Satoh ,  Takayuki Tomoeda ,  Tatsuya Iwasaki ,  Kengo Mizosaki

IPC分类号： G02F1/1333 ,  H01L21/00 ,  A46B13/04

CPC分类号： H01L21/67051 ,  G02F1/1333 ,  H01L21/67046

摘要： A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

摘要翻译： 一种基板洗涤和清洁装置，包括具有用于洗涤LCD玻璃基板的两个表面的上部和下部刷构件的机构，用于旋转上部和下部刷构件的机构，用于向上部和下部刷子提供纯水的机构 构件，用于在基板传送方向上相对于上刷毛构件和下刷构件在上刷毛构件和下刷构件之间承载衬底往复运动的机构，以及用于控制衬底承载机构的操作的控制器。