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92 条记录 (耗时 0.027 秒)

    Method of and apparatus for detecting crack condition
    1.
    发明授权
    Method of and apparatus for detecting crack condition 失效
    检测裂纹状况的方法和装置

    公开(公告)号：US4635210A

    公开(公告)日：1987-01-06

    申请号：US460811

    申请日：1983-01-25

    申请人： Kouki Shiohata ,  Kazuo Satoh ,  Motoji Ohmori ,  Katsuaki Kikuchi ,  Ryoichi Kaneko

    发明人： Kouki Shiohata ,  Kazuo Satoh ,  Motoji Ohmori ,  Katsuaki Kikuchi ,  Ryoichi Kaneko

    IPC分类号： G01M99/00 ,  G01H1/00 ,  G01H17/00 ,  G01M7/00

    CPC分类号： G01H1/003

    摘要： Disclosed is a method for detecting the condition of a crack generated in a rotor of a rotary machine during an operation thereof to check whether the crack is developing or not. The number of revolutions of the rotor and oscillations of journal end portions of the rotor born by the bearings are continually detected. The detection of the crack condition is made on the basis of the detected signal corresponding to the waveform of each half of at least one cycle of the detected rotor oscillation. Disclosed also is an apparatus for carrying out the method.

    摘要翻译： 公开了一种在操作期间检测旋转机器的转子中产生的裂纹的状况的方法，以检查裂纹是否发展。 继续检测转子转数和由轴承承载的转子的轴颈端部振动。 基于与检测到的转子振动的至少一个周期的每一半的波形相对应的检测信号进行裂纹状态的检测。 还公开了一种用于执行该方法的装置。

    Exposure method utilizing alignment of superimposed layers
    3.
    发明授权
    Exposure method utilizing alignment of superimposed layers 失效
    曝光方法利用重叠层的对准

    公开(公告)号：US5863680A

    公开(公告)日：1999-01-26

    申请号：US728367

    申请日：1996-10-10

    申请人： Masaharu Kawakubo ,  Ryoichi Kaneko

    发明人： Masaharu Kawakubo ,  Ryoichi Kaneko

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F7/70633 ,  G03F7/20 ,  G03F9/7046

    摘要： Disclosed is an exposure method for exposing an image of a pattern formed on a mask to plural layers superimposed upon a substrate, comprising: the step of storing an alignment error between the plural layers together with at least one of exposure data and alignment data; the step of setting alignment data upon exposing another pattern to the substrate on the basis of at least one of the exposure data and alignment data; and the step of displacing the mask and the substrate relative to each other on the basis of the alignment data set in the previous step. There is further disclosed an exposure apparatus for exposing an image of a pattern formed on a mask to plural layers superimposed upon a substrate, comprising a storage for storing alignment errors between the plural exposure layers together with at least one of exposure data and alignment data; and a control unit connected to the storage for setting alignment data upon exposing another pattern to the substrate on the basis of at least one of the exposure data and alignment data; wherein the control unit controls the mask and the substrate so as to be displaced relative to each other on the basis of the alignment data set.

    摘要翻译： 公开了一种曝光方法，用于将形成在掩模上的图案的图像曝光到叠加在基板上的多个层，包括：将多个层之间的对准误差与曝光数据和对准数据中的至少一个一起存储的步骤; 基于曝光数据和对准数据中的至少一个，将对准数据曝光到基板上的步骤; 以及基于在前一步骤中设置的对准数据相对于彼此移动掩模和基板的步骤。 还公开了一种用于将形成在掩模上的图案的图像曝光到叠加在基板上的多个层的曝光装置，包括用于存储多个曝光层之间的对准误差的存储器以及曝光数据和对准数据中的至少一个; 以及控制单元，连接到所述存储器，用于基于所述曝光数据和对准数据中的至少一个将另一图案暴露于所述基板来设置对准数据; 其中所述控制单元基于所述对准数据集来控制所述掩模和所述基板以相对于彼此移位。