公开(公告)号：US06710351B2

公开(公告)日：2004-03-23

申请号：US09956397

申请日：2001-09-18

Applicant: Kurt W. Berger

Inventor： Kurt W. Berger

IPC: G01J142

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/7085 ,  G21K1/062

Abstract: A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.

Abstract translation: 用于原位监测EUV辐射通量的装置包括集成反射多层叠层。 该器件的工作原理是有限量的带内EUV辐射通过整个多层堆叠传输。 该设备比现有的真空光电检测器设备提供改进，因为其校准不会随表面污染而改变。

公开(公告)号：US07196771B2

公开(公告)日：2007-03-27

申请号：US11087996

申请日：2005-03-23

Applicant: Kurt W. Berger

Inventor： Kurt W. Berger

IPC: G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70558 ,  G03F7/70716

Abstract: A detector to measure EUV intensity employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that includes: (i) a ringfield camera; (ii) a source of radiation; (iii) a condenser for processing radiation from the source of radiation to produce a ringfield illumination field for illuminating a mask; (iv) a reticle that is positioned at the ringfield camera's object plane and from which a reticle image in the form of an intensity profile is reflected into the entrance pupil of the ringfield camera, wherein the reticle moves in a direction that is transverse to the length of the ringfield illumination field that illuminates the reticle; (v) detector for measuring the entire intensity along the length of the ringfield illumination field that is projected onto the reticle; and (vi) a wafer onto which the reticle imaged is projected from the ringfield camera.

Abstract translation: 用于测量EUV强度的检测器采用线性阵列的光电二极管。 该检测器特别适用于光刻系统，其包括：（i）环形相机; （ii）辐射源; （iii）用于处理来自辐射源的辐射的聚光器，以产生用于照射面罩的环形场照明场; （iv）位于环形照相机的物平面处的标线片，并且将强度分布形式的标线图像从该掩模版反射到环形照相机的入射光瞳中，其中标线沿横向于 照射掩模版的环形场照明场的长度; （v）检测器，用于测量沿着投影到掩模版上的环形场照明场的长度的整个强度; 和（vi）将成像的掩模版从环形相机投射到的晶片。

公开(公告)号：US06781135B2

公开(公告)日：2004-08-24

申请号：US10301080

申请日：2002-11-21

Applicant: Kurt W. Berger

Inventor： Kurt W. Berger

IPC: H01L310328

CPC classification number: G01J1/429 ,  G21K1/06

Abstract: Extreme ultraviolet light is detected using a universal in-band detector for detecting extreme ultraviolet radiation that includes: (a) an EUV sensitive photodiode having a diode active area that generates a current responsive to EUV radiation; (b) one or more mirrors that reflects EUV radiation having a defined wavelength(s) to the diode active area; and (c) a mask defining a pinhole that is positioned above the diode active area, wherein EUV radiation passing through the pinhole is restricted substantially to illuminating the diode active area.

Abstract translation: 使用用于检测极紫外辐射的通用带内检测器检测极紫外光，其包括：（a）具有产生对EUV辐射的电流的二极管有源区的EUV敏感光电二极管; （b）将具有确定的波长的EUV辐射反射到二极管有源区的一个或多个反射镜; 和（c）限定位于二极管有源区域上方的针孔的掩模，其中通过针孔的EUV辐射基本上被限制以照亮二极管有源区域。

公开(公告)号：US06906781B2

公开(公告)日：2005-06-14

申请号：US10264062

申请日：2002-10-02

Applicant: Kurt W. Berger

Inventor： Kurt W. Berger

IPC: G03F7/20 ,  G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70558 ,  G03F7/70716

Abstract: A detector to measure EUV intensity employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that includes: (i) a ringfield camera; (ii) a source of radiation; (iii) a condenser for processing radiation from the source of radiation to produce a ringfield illumination field for illuminating a mask; (iv) a reticle that is positioned at the ringfield camera's object plane and from which a reticle image in the form of an intensity profile is reflected into the entrance pupil of the ringfield camera, wherein the reticle moves in a direction that is transverse to the length of the ringfield illumination field that illuminates the reticle; (v) detector for measuring the entire intensity along the length of the ringfield illumination field that is projected onto the reticle; and (vi) a wafer onto which the reticle imaged is projected from the ringfield camera.

公开(公告)号：US06130431A

公开(公告)日：2000-10-10

申请号：US96598

申请日：1998-06-12

Applicant: Kurt W. Berger

Inventor： Kurt W. Berger

IPC: H01L31/0216 ,  H01L31/103 ,  H01L31/0328

CPC classification number: H01L31/02162 ,  H01L31/103

Abstract: Extreme ultraviolet light (EUV) is detected using a precisely defined reference pattern formed over a shallow junction photodiode. The reference pattern is formed in an EUV absorber preferably comprising nickel or other material having EUV- and other spectral region attenuating characteristics. An EUV-transmissive energy filter is disposed between a passivation oxide layer of the photodiode and the EUV transmissive energy filter. The device is monolithically formed to provide robustness and compactness.

Abstract translation: 使用在浅结光电二极管上形成的精确限定的参考图案来检测极紫外光（EUV）。 参考图案形成在优选包含镍或其它具有EUV-和其他光谱区衰减特性的材料的EUV吸收体中。 EUV透射能量滤光器设置在光电二极管的钝化氧化物层和EUV透射能量滤光器之间。 该器件是单片形成的，以提供鲁棒性和紧凑性。