SYSTEMS FOR AUTOMATICALLY CHARACTERIZING A PLASMA
    1.
    发明申请
    SYSTEMS FOR AUTOMATICALLY CHARACTERIZING A PLASMA 审中-公开
    用于自动表征等离子体的系统

    公开(公告)号:US20140367042A1

    公开(公告)日:2014-12-18

    申请号:US14462969

    申请日:2014-08-19

    IPC分类号: H01J37/32 H01L21/263

    摘要: A system includes a probe arranged in a plasma processing chamber of the plasma processing system. A capacitor has one end connected to the probe. An RF source is configured to selectively supply an RF signal including RF bursts to another end of the capacitor. A plasma characterizing computing device is configured to collect a set of process data from the probe by measuring current supplied to the capacitor and voltage at the capacitor; identify a relevancy range for the set of process data, wherein the relevancy range includes process data collected after the capacitor begins discharging and before the capacitor is fully discharged; determine a set of seed values based on the process data in the relevancy range; and employ the relevancy range and the set of seed values as initial values for curve fitting corresponding to the one of the RF bursts to reduce a number of curve-fitting iterations.

    摘要翻译: 系统包括布置在等离子体处理系统的等离子体处理室中的探针。 电容器的一端连接到探头。 RF源被配置为选择性地将包括RF突发的RF信号提供给电容器的另一端。 等离子体表征计算装置被配置为通过测量提供给电容器的电流和电容器处的电压来从探针收集一组处理数据; 识别该组过程数据的相关范围,其中相关范围包括在电容器开始放电之后并且在电容器完全放电之前收集的处理数据; 基于相关范围内的过程数据确定一组种子值; 并且使用相关范围和种子值集合作为对应于RF突发中的一个的曲线拟合的初始值,以减少曲线拟合迭代的数量。