公开(公告)号：US20170115573A1

公开(公告)日：2017-04-27

申请号：US15318539

申请日：2015-08-18

Applicant: LG CHEM, LTD.

Inventor： Tae Moon PARK ,  Dae Chul JUNG ,  Dong Hoon LEE ,  Woo Ram LEE ,  Hyun Jun LEE ,  Ju Young KIM

IPC: G03F7/42 ,  C11D3/00 ,  C11D3/43 ,  C11D3/30 ,  H01L21/02 ,  C11D3/32 ,  C11D3/20 ,  C11D3/37 ,  H01L21/027 ,  C11D11/00 ,  C11D3/28

CPC classification number: G03F7/42 ,  C11D3/0073 ,  C11D3/2068 ,  C11D3/28 ,  C11D3/30 ,  C11D3/32 ,  C11D3/373 ,  C11D3/43 ,  C11D11/0047 ,  G03F7/11 ,  G03F7/325 ,  G03F7/40 ,  G03F7/425 ,  G03F7/426 ,  H01L21/0206 ,  H01L21/0274 ,  H01L21/0276

Abstract: The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.