公开(公告)号：US20180341176A1

公开(公告)日：2018-11-29

申请号：US15776748

申请日：2017-01-31

Applicant: LG CHEM, LTD.

Inventor： Ji Young HWANG ,  Han Min SEO ,  Sangcholl HAN ,  Seung Heon LEE ,  Dong Hyun OH ,  Dae Han SEO ,  Nam Seok BAE ,  Min Soo SONG

IPC: G03F7/20 ,  H01L21/033 ,  G03F7/00

Abstract: The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and groove portions provided in a region where the darkened light-shielding pattern layer is not provided, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern manufactured by using the same.

公开(公告)号：US20180348627A1

公开(公告)日：2018-12-06

申请号：US15776759

申请日：2017-01-31

Applicant: LG CHEM, LTD.

Inventor： Ji Young HWANG ,  Han Min SEO ,  Nam Seok BAE ,  Seung Heon LEE ,  Dong Hyun OH ,  Jungsun YOU

IPC: G03F1/76 ,  G03F1/48

CPC classification number: G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  H01L21/033

Abstract: The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.

公开(公告)号：US20170225434A1

公开(公告)日：2017-08-10

申请号：US15502933

申请日：2015-08-11

Applicant: LG CHEM, LTD.

Inventor： Donghyun LEE ,  Seung Heon LEE ,  Jiehyun SEONG ,  Joo Yeon KIM ,  Sarah KIM ,  Jung Yeon LEE ,  Nam Seok BAE

IPC: B32B15/20 ,  B32B15/02

CPC classification number: B32B15/20 ,  B32B15/02

Abstract: The present specification relates to an aluminum oxide composition, a substrate including the same, and a method for manufacturing the same.

公开(公告)号：US20200272016A1

公开(公告)日：2020-08-27

申请号：US16762609

申请日：2019-03-11

Applicant: LG CHEM, LTD.

Inventor： Yong Goo SON ,  Nam Seok BAE ,  Seung Heon LEE

IPC: G02F1/167 ,  G03F7/00 ,  G03F7/028

Abstract: Provided is a black partition wall pattern film that comprises: a transparent substrate; an electrode layer provided on the transparent substrate; a black partition wall pattern provided on the electrode layer; and a black UV-curable resin layer provided in a region of the electrode layer where no black partition wall pattern is provided.

公开(公告)号：US20180329286A1

公开(公告)日：2018-11-15

申请号：US15776042

申请日：2017-01-31

Applicant: LG CHEM, LTD.

Inventor： Ji Young HWANG ,  Han Min SEO ,  Nam Seok BAE ,  Seung Heon LEE ,  Dong Hyun OH ,  Chan Hyoung PARK ,  Ki-Hwan KIM ,  Ilha LEE

IPC: G03F1/54 ,  G03F7/20 ,  G03F1/56 ,  G03F1/38 ,  G03F1/48

CPC classification number: G03F1/54 ,  G03F1/38 ,  G03F1/48 ,  G03F1/56 ,  G03F7/20 ,  H01L21/033

Abstract: The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.