Abstract:
Embodiments relate to an organic light emitting display device and a method of manufacturing the same. The organic light emitting display device includes a pixel area that includes at least a first sub pixel area. The first sub pixel area includes a color filter, a first overcoat element on the color filter, wherein a portion of the color filter at an edge portion of the first sub pixel area is not covered by the first overcoat element, and an electrode disposed on the pixel area, wherein the electrode is on the portion of the color filter not covered by the first overcoat element.
Abstract:
There are provided an oxide TFT, a method for fabricating a TFT, an array substrate for a display device having a TFT, and a method for fabricating the display device. The oxide thin film transistor includes: a gate electrode formed on a substrate; a gate insulating layer formed on the entire surface of the substrate including the gate electrode; an active layer pattern formed on the gate insulating layer above the gate electrode and completely overlapping the gate electrode; an etch stop layer pattern formed on the active layer pattern and the gate insulating layer; and a source electrode and a drain electrode formed on the gate insulating layer including the etch stop layer pattern and the active layer pattern and spaced apart from one another, and overlapping both sides of the etch stop layer pattern and the underlying active layer pattern.
Abstract:
Embodiments relate to an organic light emitting display device and a method of manufacturing the same. The organic light emitting display device includes a pixel area that includes at least a first sub pixel area. The first sub pixel area includes a color filter, a first overcoat element on the color filter, wherein a portion of the color filter at an edge portion of the first sub pixel area is not covered by the first overcoat element, and an electrode disposed on the pixel area, wherein the electrode is on the portion of the color filter not covered by the first overcoat element.
Abstract:
There are provided an oxide TFT, a method for fabricating a TFT, an array substrate for a display device having a TFT, and a method for fabricating the display device. The oxide thin film transistor includes: a gate electrode formed on a substrate; a gate insulating layer formed on the entire surface of the substrate including the gate electrode; an active layer pattern formed on the gate insulating layer above the gate electrode and completely overlapping the gate electrode; an etch stop layer pattern formed on the active layer pattern and the gate insulating layer; and a source electrode and a drain electrode formed on the gate insulating layer including the etch stop layer pattern and the active layer pattern and spaced apart from one another, and overlapping both sides of the etch stop layer pattern and the underlying active layer pattern.