Array substrate having color filter on thin film transistor structure for LCD device and method of fabricating the same
    1.
    发明申请
    Array substrate having color filter on thin film transistor structure for LCD device and method of fabricating the same 有权
    用于LCD器件的薄膜晶体管结构上具有滤色器的阵列衬底及其制造方法

    公开(公告)号:US20040109102A1

    公开(公告)日:2004-06-10

    申请号:US10724892

    申请日:2003-12-02

    Abstract: An array substrate device includes a gate line formed on a substrate extending along a first direction having a gate electrode, a data line formed on the substrate extending along a second direction having a data pad disposed apart from a first end of the data line, the data and gate lines defining a pixel region, a gate pad formed on the substrate disposed apart from a first end of the gate line, a thin film transistor formed at a crossing region of the gate and data lines and including the gate electrode, a semiconductor layer, a source electrode, and a drain electrode, a black matrix overlapping the thin film transistor, the gate line, and the data line except for a first portion of the drain electrode, a first pixel electrode at the pixel region contacting the first portion of the drain electrode and the substrate, a color filter on the first pixel electrode at the pixel region, and a second pixel electrode on the color filter contacting the first pixel electrode.

    Abstract translation: 阵列基板装置包括形成在沿着具有栅电极的第一方向延伸的基板上的栅极线,形成在沿着第二方向延伸的基板上的数据线,具有与数据线的第一端分开的数据焊盘, 限定像素区域的数据和栅极线,形成在与栅极线的第一端分离的衬底上的栅极焊盘,形成在栅极和数据线的交叉区域并且包括栅电极的薄膜晶体管,半导体 源极电极和漏极电极,与薄膜晶体管重叠的黑矩阵,栅极线和除了漏电极的第一部分之外的数据线,与像素区域接触的第一部分的第一像素电极 漏极电极和衬底的像素区域上的第一像素电极上的滤色器和与第一像素电极接触的滤色器上的第二像素电极。

    Method of fabricating array substrate having color filter on thin film transistor structure
    2.
    发明申请
    Method of fabricating array substrate having color filter on thin film transistor structure 有权
    在薄膜晶体管结构上制造具有滤色器的阵列基板的方法

    公开(公告)号:US20040119903A1

    公开(公告)日:2004-06-24

    申请号:US10728835

    申请日:2003-12-08

    CPC classification number: G02F1/133516 G02F2001/136222

    Abstract: A method of forming an array substrate for use in a liquid crystal display device includes forming a gate line, a gate pad, and a gate electrode, forming a first gate insulating layer to cover the gate line, the gate pad, and the gate electrode, forming an active layer and an ohmic contact layer on the first gate insulating layer, forming a data line, a data pad, a source electrode, and a drain electrode, forming a second insulating layer to cover the thin film transistor, forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode, forming a third insulating layer to cover the black matrix, patterning the first, second, and third insulating layers, forming a first transparent electrode layer to cover the patterned third insulating layer, coating an adhesive color film on the first transparent electrode layer, irradiating a laser to portions of the adhesive color film corresponding to the pixel region, removing the adhesive color film to form a color film, repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions, forming a second transparent electrode to cover the color filter and the first transparent electrode layer, and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.

    Abstract translation: 形成用于液晶显示装置的阵列基板的方法包括:形成栅极线,栅极焊盘和栅极电极,形成第一栅极绝缘层以覆盖栅极线,栅极焊盘和栅极电极 在所述第一栅极绝缘层上形成有源层和欧姆接触层,形成数据线,数据焊盘,源电极和漏电极,形成第二绝缘层以覆盖所述薄膜晶体管,形成黑色 在第二绝缘层上覆盖薄膜晶体管,栅极线和除了漏电极的第一部分之外的数据线,形成第三绝缘层以覆盖黑矩阵,图案化第一绝缘层,第二绝缘层和第三绝缘层 形成第一透明电极层以覆盖所述图案化的第三绝缘层,在所述第一透明电极层上涂覆粘合剂着色膜,向所述粘合剂着色膜的部分照射激光 去除像素区域,去除粘合剂着色膜以形成彩色膜,重复涂布粘合剂着色膜,照射激光并去除粘合剂着色膜,以在所有像素区域内形成彩色膜,形成第二透明电极 覆盖滤色器和第一透明电极层,以及对第一和第二透明电极层进行构图以形成第一和第二像素电极,双层栅极焊盘端子和双层数据焊盘端子。

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