公开(公告)号：US20250022696A1

公开(公告)日：2025-01-16

申请号：US18712902

申请日：2021-11-23

Applicant: Lam Research Corporation

Inventor： Xin Meng ,  Xinyi Chen ,  Sreeram Sonti ,  Kevin Bertsch ,  Defu Liang ,  Zhuozhi Chen ,  Rohit Ode ,  William Schlosser ,  Tongtong Guo ,  Rachel E. Batzer

IPC: H01J37/32

Abstract: Systems and methods for redirecting cleaning chemistry flows within a multi-station semiconductor processing chamber are disclosed. In such systems, a cleaning chemistry flow, e.g., a plasma from a remote plasma generator, may be directed onto a hub of an indexer that is centrally mounted within the chamber. The hub may have features that cause the cleaning chemistry flows to be redirected in a radially outward direction. By rotating the hub and/or changing the relative elevational positions between the hub and a cleaning chemistry inlet that provides the cleaning chemistry, the cleaning chemistry may be redirected into different regions of the chamber, thereby allowing for a more thorough and complete cleaning process.