公开(公告)号：US20250052272A1

公开(公告)日：2025-02-13

申请号：US18720496

申请日：2022-12-14

Applicant: Lam Research Corporation

Inventor： Rohit Ode ,  Troy Alan Gomm

IPC: F16B33/06 ,  F16B33/00 ,  H01J37/32

Abstract: Disclosed herein are fasteners for use in a semiconductor wafer process chamber. The fasteners may be used to secure hardware. The fasteners may include outermost surfaces that are provided by multiple different coatings, e.g., a hard coating and a dry lubricant coating. The hard coating may provide outermost surfaces of the fastener that are exposed to a plasma when a remote plasma clean is performed and may be used to prevent particle generation when the fastener is subjected to the remote plasma clean. The dry lubricant coating may provide outermost surfaces of a threaded portion of the fastener and may be used to prevent galling.

公开(公告)号：US20250022696A1

公开(公告)日：2025-01-16

申请号：US18712902

申请日：2021-11-23

Applicant: Lam Research Corporation

Inventor： Xin Meng ,  Xinyi Chen ,  Sreeram Sonti ,  Kevin Bertsch ,  Defu Liang ,  Zhuozhi Chen ,  Rohit Ode ,  William Schlosser ,  Tongtong Guo ,  Rachel E. Batzer

IPC: H01J37/32

Abstract: Systems and methods for redirecting cleaning chemistry flows within a multi-station semiconductor processing chamber are disclosed. In such systems, a cleaning chemistry flow, e.g., a plasma from a remote plasma generator, may be directed onto a hub of an indexer that is centrally mounted within the chamber. The hub may have features that cause the cleaning chemistry flows to be redirected in a radially outward direction. By rotating the hub and/or changing the relative elevational positions between the hub and a cleaning chemistry inlet that provides the cleaning chemistry, the cleaning chemistry may be redirected into different regions of the chamber, thereby allowing for a more thorough and complete cleaning process.