公开(公告)号：US20210269918A1

公开(公告)日：2021-09-02

申请号：US17322324

申请日：2021-05-17

Applicant: Lam Research Corporation

Inventor： Rachel BATZER ,  Zhe GUI ,  Galbokka Hewage Layan SAVITHRA

IPC: C23C16/455 ,  H01J37/32

Abstract: A showerhead for a substrate processing system includes a lower surface, a plasma-facing upper surface, a gas plenum defined between the lower surface and the upper surface, and a plurality of injectors distributed on the lower surface, wherein the plurality of injectors are in fluid communication with the gas plenum. A plurality of through holes extends from the upper surface to the lower surface. Selected ones of the plurality of through holes have a diameter that is different from a diameter of remaining ones of the plurality of through holes. The diameter of the selected ones of the plurality of through holes is predetermined in accordance with a desired ratio of respective gases provided via the selected ones of the plurality of through holes and the remaining ones of the plurality of through holes.

公开(公告)号：US20210371982A1

公开(公告)日：2021-12-02

申请号：US17401261

申请日：2021-08-12

Applicant: Lam Research Corporation

Inventor： Rachel BATZER ,  Huatan Qiu ,  Bhadri Varadarajan ,  Patrick Girard Breiling ,  Bo Gong ,  Will Schlosser ,  Zhe Gui ,  Taide Tan ,  Geoffrey Hohn

IPC: C23C16/455 ,  H01J37/32 ,  C23C16/505 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

公开(公告)号：US20190177846A1

公开(公告)日：2019-06-13

申请号：US16213386

申请日：2018-12-07

Applicant: LAM RESEARCH CORPORATION

Inventor： Rachel BATZER ,  Zhe GUI ,  Galbokka Hewage Layan SAVITHRA

IPC: C23C16/455 ,  H01J37/32

Abstract: A showerhead for a substrate processing system includes a lower surface, a plasma-facing upper surface, a gas plenum defined between the lower surface and the upper surface, and a plurality of injectors distributed on the lower surface, wherein the plurality of injectors are in fluid communication with the gas plenum. A plurality of through holes extends from the upper surface to the lower surface. Selected ones of the plurality of through holes have a diameter that is different from a diameter of remaining ones of the plurality of through holes. The diameter of the selected ones of the plurality of through holes is predetermined in accordance with a desired ratio of respective gases provided via the selected ones of the plurality of through holes and the remaining ones of the plurality of through holes.