公开(公告)号：US11004662B2

公开(公告)日：2021-05-11

申请号：US15432314

申请日：2017-02-14

Applicant: Lam Research Corporation

Inventor： Taide Tan ,  Huatan Qiu ,  Ryan Senff

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/458 ,  C23C16/507

Abstract: A system for processing a substrate includes a chamber having a chamber wall that defines a lower chamber portion and an upper chamber wall that defines an upper chamber portion. A showerhead is disposed in the upper chamber portion. A pedestal with a support for the substrate is disposed in the lower chamber portion and oriented below the showerhead, such that a processing region is defined between the support of the pedestal and the showerhead. A spacer is disposed between the showerhead and the lower chamber wall of the lower chamber portion. The spacer is defined by an annular body that includes a vertical component. The annular body also includes a side extension that is disposed outside of the processing region and projects radially away from the vertical component. The annular body includes a groove that is formed in the side extension so as to surround the vertical component of the annular body. A heating element is embedded in the groove of the side extension.

公开(公告)号：US20180233326A1

公开(公告)日：2018-08-16

申请号：US15432314

申请日：2017-02-14

Applicant: Lam Research Corporation

Inventor： Taide Tan ,  Huatan Qiu ,  Ryan Senff

IPC: H01J37/32 ,  C23C16/505 ,  C23C16/458 ,  C23C16/455

CPC classification number: H01J37/3244 ,  C23C16/45565 ,  C23C16/4585 ,  C23C16/507 ,  H01J37/3211 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/3321

Abstract: A system for processing a substrate includes a chamber having a chamber wall that defines a lower chamber portion and an upper chamber wall that defines an upper chamber portion. A showerhead is disposed in the upper chamber portion. A pedestal with a support for the substrate is disposed in the lower chamber portion and oriented below the showerhead, such that a processing region is defined between the support of the pedestal and the showerhead. A spacer is disposed between the showerhead and the lower chamber wall of the lower chamber portion. The spacer is defined by an annular body that includes a vertical component. The annular body also includes a side extension that is disposed outside of the processing region and projects radially away from the vertical component. The annular body includes a groove that is formed in the side extension so as to surround the vertical component of the annular body. A heating element is embedded in the groove of the side extension.