公开(公告)号：US10957561B2

公开(公告)日：2021-03-23

申请号：US14945680

申请日：2015-11-19

申请人： Lam Research Corporation

发明人： John Drewery ,  Yoshie Kimura ,  James Adams ,  Yoko Yamaguchi Adams ,  Tony Zemlock

IPC分类号： H01L21/67 ,  H01J37/32 ,  C23C16/455 ,  C30B25/16

摘要： A gas delivery system for a substrate processing system includes a first manifold and a second manifold. A gas delivery sub-system selectively delivers gases from gas sources. The gas delivery sub-system delivers a first gas mixture to the first manifold and a second gas mixture. A gas splitter includes an inlet in fluid communication with an outlet of the second manifold, a first outlet in fluid communication with an outlet of the first manifold, and a second outlet. The gas splitter splits the second gas mixture into a first portion at a first flow rate that is output to the first outlet and a second portion at a second flow rate that is output to the second outlet. First and second zones of the substrate processing system are in fluid communication with the first and second outlets of the gas splitter, respectively.

公开(公告)号：US20170032982A1

公开(公告)日：2017-02-02

申请号：US14945680

申请日：2015-11-19

申请人： Lam Research Corporation

发明人： John Drewery ,  Yoshie Kimura ,  James Adams ,  Yoko Yamaguchi Adams ,  Tony Zemlock

IPC分类号： H01L21/67 ,  F16L55/07 ,  F16L41/02

CPC分类号： H01L21/67017

摘要： A gas delivery system for a substrate processing system includes a first manifold and a second manifold. A gas delivery sub-system selectively delivers gases from gas sources. The gas delivery sub-system delivers a first gas mixture to the first manifold and a second gas mixture. A gas splitter includes an inlet in fluid communication with an outlet of the second manifold, a first outlet in fluid communication with an outlet of the first manifold, and a second outlet. The gas splitter splits the second gas mixture into a first portion at a first flow rate that is output to the first outlet and a second portion at a second flow rate that is output to the second outlet. First and second zones of the substrate processing system are in fluid communication with the first and second outlets of the gas splitter, respectively.

摘要翻译： 用于基板处理系统的气体输送系统包括第一歧管和第二歧管。 气体输送子系统选择性地从气体源输送气体。 气体输送子系统将第一气体混合物输送到第一歧管和第二气体混合物。 气体分配器包括与第二歧管的出口流体连通的入口，与第一歧管的出口流体连通的第一出口和第二出口。 气体分配器以第一流量将第二气体混合物分成第一部分，第一流量输出到第一出口，第二部分以第二流量分配，输出到第二出口。 基板处理系统的第一和第二区分别与气体分离器的第一和第二出口流体连通。