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公开(公告)号:US06450117B1
公开(公告)日:2002-09-17
申请号:US09633494
申请日:2000-08-07
申请人: Laxman Murugesh , Padmanaban Krishnaraj , Michael Cox , Canfeng Lai , Narendra Dubey , Tom K. Cho , Sudhir Ram Gondhalekar , Lily L. Pang
发明人: Laxman Murugesh , Padmanaban Krishnaraj , Michael Cox , Canfeng Lai , Narendra Dubey , Tom K. Cho , Sudhir Ram Gondhalekar , Lily L. Pang
IPC分类号: C23C1600
CPC分类号: C23C16/45574 , C23C16/4402 , C23C16/4405 , C23C16/452 , C23C16/45508 , H01J37/3244 , H01J37/32862 , Y10S438/905
摘要: A substrate processing chamber 30 comprising a first gas distributor 65 adapted to provide a process gas into the chamber 30 to process the substrate 25, a second gas distributor 215 adapted to provide a cleaning gas into the chamber 30 to clean the chamber, and an exhaust 90 to exhaust the process gas or cleaning gas from the chamber 30.
摘要翻译: 衬底处理室30,其包括适于将处理气体提供到室30中以处理衬底25的第一气体分配器65,适于将清洁气体提供到腔室30中以清洁腔室的第二气体分配器215以及排气 以从腔室30排出处理气体或清洁气体。