Method and system for combined photothermal modulated reflectance and photothermal IR radiometric system
    1.
    发明申请
    Method and system for combined photothermal modulated reflectance and photothermal IR radiometric system 失效
    光热调制反射和光热红外辐射系统的组合方法和系统

    公开(公告)号:US20050225765A1

    公开(公告)日:2005-10-13

    申请号:US11143203

    申请日:2005-06-02

    摘要: A method and apparatus for evaluating a semiconductor wafer. A combination of a photothermal modulated reflectance method and system with a photothermal IR radiometry system and method is utilized to provide information which can be used to determine properties of semiconductor wafers being evaluated. The system and method can provide for utilizing a common probe source and a common intensity modulated energy source. The system and method further provide an infrared detector for monitoring changes in infrared radiation emitted from a sample, and photodetector for monitoring changes in beam reflected from the sample.

    摘要翻译: 一种用于评估半导体晶片的方法和装置。 利用光热调制反射方法和具有光热IR辐射测量系统和方法的系统的组合来提供可用于确定被评估的半导体晶片的性质的信息。 该系统和方法可以提供利用公共探测源和共同的强度调制能量源。 该系统和方法还提供一种红外检测器,用于监测从样品发射的红外辐射的变化,以及用于监测从样品反射的光束变化的光电检测器。