公开(公告)号：US06428638B2

公开(公告)日：2002-08-06

申请号：US09832448

申请日：2001-04-10

申请人： Lijun Yao ,  Tadao Ueda

发明人： Lijun Yao ,  Tadao Ueda

IPC分类号： C22F100

CPC分类号： C22F1/183 ,  C22F1/04 ,  C22F1/08 ,  C23C14/3414

摘要： The invention includes methods of reducing grain sizes of materials, and methods of forming sputtering targets. The invention includes a method for producing a sputtering target material in which a metallic material is subjected to plastic working at a processing percentage of at least 5% and a processing rate of at least 100%/second. In particular applications the metallic material comprises one or more of aluminum, copper and titanium.

公开(公告)号：US06416595B2

公开(公告)日：2002-07-09

申请号：US09833504

申请日：2001-04-09

申请人： Lijun Yao ,  Tadao Ueda

发明人： Lijun Yao ,  Tadao Ueda

IPC分类号： C22C1400

CPC分类号： C22F1/183 ,  C22F1/04 ,  C22F1/08 ,  C23C14/3414

摘要： A titanium material with titanium grains, wherein the average crystal grain size is less than 4 &mgr;m. The material is at least 99.99% (4N purity) titanium. The alloy is especially useful as a sputtering target. The material is produced by processing the material with plastic working of at least 5% at a rate of at least 100%/second.

摘要翻译： 具有钛颗粒的钛材料，其中平均晶粒尺寸小于4μm。 该材料至少为99.99％（4N纯度）钛。 该合金作为溅射靶特别有用。 该材料通过以至少5％的塑性加工方式以至少100％/秒的速率进行加工。

公开(公告)号：US06746553B2

公开(公告)日：2004-06-08

申请号：US10165569

申请日：2002-06-07

申请人： Lijun Yao ,  Tadao Ueda

发明人： Lijun Yao ,  Tadao Ueda

IPC分类号： C22F100

CPC分类号： C22F1/183 ,  C22F1/04 ,  C22F1/08 ,  C23C14/3414

摘要： The invention includes methods of reducing grain sizes of materials, and methods of forming sputtering targets. The invention includes a method for producing a sputtering target material in which a metallic material is subjected to plastic working at a processing percentage of at least 5% and a processing rate of at least 100%/second. In particular applications the metallic material comprises one or more of aluminum, copper and titanium.

摘要翻译： 本发明包括减少材料的晶粒尺寸的方法和形成溅射靶的方法。 本发明包括一种制造溅射靶材料的方法，其中金属材料以至少5％的加工百分比和至少100％/秒的加工率进行塑性加工。 在具体应用中，金属材料包括铝，铜和钛中的一种或多种。

公开(公告)号：US06423161B1

公开(公告)日：2002-07-23

申请号：US09627496

申请日：2000-07-28

申请人： Lijun Yao ,  Tadao Ueda

发明人： Lijun Yao ,  Tadao Ueda

IPC分类号： C22C2100

CPC分类号： C22F1/183 ,  C22F1/04 ,  C22F1/08 ,  C23C14/3414

摘要： The invention includes a material containing aluminum grains which have an average grain size of less than 20 &mgr;m. The material contains manganese, with a total non-aluminum content of 0.01 to 10.0% by weight. The material is preferably used as a sputtering target. A sputtering target is produced by subjecting the material to plastic working at a processing percentage of at least 5% at a processing rate of at least 100%/second.

摘要翻译： 本发明包括平均粒径小于20μm的含有铝颗粒的材料。 该材料含有锰，总非铝含量为0.01至10.0重量％。 该材料优选用作溅射靶。 通过以至少100％/秒的加工速率使材料以至少5％的加工百分比进行塑性加工来制造溅射靶。