摘要:
Disclosed is a flash EEPROM cell needing only a 5 volt external source using an on-chip voltage multiplier circuit to provide high voltages necessary to effect Fowler-Nordheim tunneling during both the program and erase modes. Properties of dielectric layers between a floating gate and a control gate and between the floating gate and a drain region differ to facilitate programming and erasing of the floating gate. Also disclosed is a method for producing a flash EEPROM cell by forming the insulative layer between a floating gate and a control gate to have a capacitance lower than the capacitance of the insulating layer between the floating gate and a drain region.
摘要:
Disclosed is a flash EEPROM cell needing only a 5 volt external source using an on-chip voltage multiplier circuit to provide high voltages necessary to effect Fowler-Nordheim tunneling during both the program and erase modes. Properties of dielectric layers between a floating gate and a control gate and between the floating gate and a drain region differ to facilitate programming and erasing of the floating gate. Also disclosed is a method for producing a flash EEPROM cell by forming the insulative layer between a floating gate and a control gate to have a capacitance lower than the capacitance of the insulating layer between the floating gate and a drain region.
摘要:
Disclosed is a flash EEPROM cell needing only a 5 volt external source using an on-chip voltage multiplier circuit to provide high voltages necessary to effect Fowler-Nordheim tunneling during both the program and erase modes. Properties of dielectric layers between a floating gate and a control gate and between the floating gate and a drain region differ to facilitate programming and erasing of the floating gate. Also disclosed is a method for producing a flash EEPROM cell by forming the insulative layer between a floating gate and a control gate to have a capacitance lower than the capacitance of the insulating layer between the floating gate and a drain region.
摘要:
Disclosed is a byte-erasable EEPROM memory cell which utilizes a five volt external source and a voltage multiplier circuit to program and erase a floating gate by means of electron tunneling. To prevent collapse of the voltage multiplier circuit a lightly doped drain region is incorporated preventing gate modulated junction breakdown, thereby preventing collapse of the voltage multiplier circuit. In addition, current flow through the channel separating a source region and the lightly doped drain region is controlled by a portion of a control gate and the floating gate, thereby allowing a higher erased cell threshold voltage. Also disclosed is a process for forming the lightly doped drain region by using the control gate as an effective sidewall spacer.
摘要:
A nonvolatile semiconductor memory includes a plurality of memory cells arranged in columns and rows, a plurality of word lines, a plurality of bit lines, a plurality of output buffers, and a plurality of page buffers grouped in a plurality of sub-pages. Each page buffer is connected to corresponding bit lines through a first column decoder circuit and connected to one corresponding output buffer through a second column decoder circuit. This construction allows the peripheral control circuits to clock out data stored in page buffers of a first sub-page into output buffers while latching bit line data into page buffers of a second sub-page. Therefore, this architecture is able to perform read and update the page buffer data of different sub-pages simultaneously. Two sets of address registers are used to store the starting and the end address for programming. During programming, only sub-pages located between the starting and end address will be programmed successively. This sub-page programming technique greatly reduces the disturbance and programming time.
摘要:
A nonvolatile semiconductor memory includes a plurality of memory cells arranged in columns and rows, a plurality of word lines, a plurality of bit lines, a plurality of output buffers, and a plurality of page buffers grouped in a plurality of sub-pages. Each page buffer is connected to corresponding bit lines through a first column decoder circuit and connected to one corresponding output buffer through a second column decoder circuit. This construction allows the peripheral control circuits to clock out data stored in page buffers of a first sub-page into output buffers while latching bit line data into page buffers of a second sub-page. Therefore, this architecture is able to perform read and update the page buffer data of different sub-pages simultaneously. Two sets of address registers are used to store the starting and the end address for programming. During programming, only sub-pages located between the starting and end address will be programmed successively. This sub-page programming technique greatly reduces the disturbance and programming time.
摘要:
A nonvolatile semiconductor memory includes a plurality of memory cells arranged in columns and rows, a plurality of word lines, a plurality of bit lines, a plurality of output buffers, and a plurality of page buffers grouped in a plurality of sub-pages. Each page buffer is connected to corresponding bit lines through a first column decoder circuit and connected to one corresponding output buffer through a second column decoder circuit. This construction allows the peripheral control circuits to clock out data stored in page buffers of a first sub-page into output buffers while latching bit line data into page buffers of a second sub-page. Therefore, this architecture is able to perform read and update the page buffer data of different sub-pages simultaneously. Two sets of address registers are used to store the starting and the end address for programming. During programming, only sub-pages located between the starting and end address will be programmed successively. This sub-page programming technique greatly reduces the disturbance and programming time.