公开(公告)号：US5606251A

公开(公告)日：1997-02-25

申请号：US275637

申请日：1994-07-15

申请人： Lynn S. Ryle ,  Robert M. Ruppell ,  David L. Thrasher ,  Martin J. McGrath

发明人： Lynn S. Ryle ,  Robert M. Ruppell ,  David L. Thrasher ,  Martin J. McGrath

IPC分类号： H01L21/00 ,  G01N21/86 ,  G01R27/26

CPC分类号： H01L21/67173 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67196 ,  H01L21/67259 ,  Y10S414/136 ,  Y10S414/137

摘要： An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels are provided between modules to prevent leakage between the modules. A substrate transport mechanism which is moveable along a rail is provided with the stabilizer to provide for stable substrate transfer. The processing system has two brush stations which are placed within a single enclosure. The sensors located throughout the system, which sense the presence of a wafer, are fixedly mounted in a frame so that they are self-aligned to one another. In the sender station, two sensors are used, with the system requiring both sensors to sense the presence of a wafer to increase the reliability. In the dry station, the heating lamp is shielded from the substrate to reduce particulate contamination. Various flow meters are mounted on a transparent panel to provide easy and convenient hook-up. The system is provided with an airflow control bulkhead between the clean and dirty side of the system to prevent intermixing to thereby provide for lower contamination levels in the clean side of the system.

摘要翻译： 改进的基板处理系统。 该系统可用于半导体衬底的双面擦洗。 系统的湿站具有防止积聚的液体滴落在车站外部并且使滴落在基底上最小化的盖子。 在模块之间提供运输隧道，以防止模块之间的泄漏。 可沿轨道移动的基板输送机构设置有稳定器以提供稳定的基板转印。 处理系统具有放置在单个外壳内的两个刷台。 位于整个系统中的感测晶片存在的传感器被固定地安装在框架中，使得它们彼此自对准。 在发送站中，使用两个传感器，系统需要两个传感器来感测晶片的存在以提高可靠性。 在干燥站，加热灯与基板隔离，以减少颗粒污染。 各种流量计安装在透明面板上，提供简单方便的连接。 该系统在系统的清洁和脏污的一侧设置有气流控制隔板，以防止混合，从而在系统的清洁侧面提供较低的污染水平。

公开(公告)号：US5745946A

公开(公告)日：1998-05-05

申请号：US688062

申请日：1996-07-29

申请人： David L. Thrasher ,  Lynn S. Ryle ,  Robert M. Ruppell ,  John S. Hearne ,  Wilbur C. Krussell ,  Gary D. Youre

发明人： David L. Thrasher ,  Lynn S. Ryle ,  Robert M. Ruppell ,  John S. Hearne ,  Wilbur C. Krussell ,  Gary D. Youre

IPC分类号： B08B17/00 ,  H01L21/00 ,  B08B11/00 ,  B08B3/02

CPC分类号： H01L21/67028 ,  B08B17/00 ,  Y10S134/902

摘要： An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels are provided between modules to prevent leakage between the modules. A substrate transport mechanism which is moveable along a rail is provided with the stabilizer to provide for stable substrate transfer. The processing system has two brush stations which are placed within a single enclosure. The sensors located throughout the system, which sense the presence of a wafer, are fixedly mounted in a frame so that they are self-aligned to one another. In the sender station, two sensors are used, with the system requiring both sensors to sense the presence of a wafer to increase the reliability. In the dry station, the heating lamp is shielded from the substrate to reduce particulate contamination. Various flow meters are mounted on a transparent panel to provide easy and convenient hook-up. The system is provided with an airflow control bulkhead between the clean and dirty side of the system to prevent intermixing to thereby provide for lower contamination levels in the clean side of the system.

摘要翻译： 改进的基板处理系统。 该系统可用于半导体衬底的双面擦洗。 系统的湿站具有防止积聚的液体滴落在车站外部并且使滴落在基底上最小化的盖子。 在模块之间提供运输隧道，以防止模块之间的泄漏。 可沿轨道移动的基板输送机构设置有稳定器以提供稳定的基板转印。 处理系统具有放置在单个外壳内的两个刷台。 位于整个系统中的感测晶片存在的传感器被固定地安装在框架中，使得它们彼此自对准。 在发送站中，使用两个传感器，系统需要两个传感器来感测晶片的存在以提高可靠性。 在干燥站，加热灯与基板隔离，以减少颗粒污染。 各种流量计安装在透明面板上，提供简单方便的连接。 该系统在系统的清洁和脏污的一侧设置有气流控制隔板，以防止混合，从而在系统的清洁侧面提供较低的污染水平。