公开(公告)号：US20140197330A1

公开(公告)日：2014-07-17

申请号：US14241109

申请日：2012-09-10

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Jerry Johannes Martinus Peijster ,  Rogier Martin Lambert Ellenbroek ,  Guido De Boer

IPC: H01J37/20 ,  H01J37/317 ,  F16F15/04

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  F16F15/04 ,  F16F15/085 ,  G03F7/70833 ,  G03F7/709 ,  H01J37/02 ,  H01J37/3177 ,  H01J2237/0216

Abstract: The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.

Abstract translation: 本发明涉及一种用于光刻设备或检查设备的隔振模块（101）。 模块包括用于容纳光刻设备的支撑框架（102），中间体（103）和支撑体（104）。 中间体通过至少一个弹簧元件连接到支撑框架，使得中间体是悬挂体。 支撑体通过至少一个摆杆（108）连接到中间体，使得支撑体是悬挂体。 本发明还涉及包括这种隔振模块的基板处理系统。