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公开(公告)号:US11422390B2
公开(公告)日:2022-08-23
申请号:US16849859
申请日:2020-04-15
Applicant: Meta Platforms Technologies, LLC
Inventor: Matthieu Charles Raoul Leibovici , Jasmine Soria Sears , Christophe Antoine Hurni , Nathan Matsuda , Guohua Wei , Yu Shi , John Goward
Abstract: A device includes an optical assembly and a digital projector. The optical assembly is configured to receive visible scene light at a backside of the optical assembly and to direct the visible scene light on an optical path toward an eyeward side. The optical assembly includes a dimming layer disposed on the optical path. The dimming layer includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. The digital projector is disposed on the eyeward side of the optical assembly and is configured to selectively emit an activation light within the range of light wavelengths to activate a darkening of a region of the dimming layer to dim the visible scene light within the region.
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公开(公告)号:US12256153B1
公开(公告)日:2025-03-18
申请号:US17969605
申请日:2022-10-19
Applicant: META PLATFORMS TECHNOLOGIES, LLC
Inventor: Yun-Han Lee , Matthieu Charles Raoul Leibovici , Chulwoo Oh , Hyunmin Song , Junren Wang
Abstract: Various embodiments set forth eye tracking systems. In some embodiments, an eye tracking system includes a polarization volume hologram (PVH) combiner having a rolling k-vector design that provides relatively wide coverage of users whose eyeglasses prescriptions can vary. The PVH combiner can further include (1) fiducial regions created by differential patterning that generate dark regions in images captured of an eye, and/or (2) multiple regions that diffract light at angles to produce different perspectives in the captured images. The dark regions and/or different perspectives can be used to calibrate eye tracking. In addition, the PVH combiner can include off-axis lens regions that generate glints for the eye tracking.
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公开(公告)号:US20220326436A1
公开(公告)日:2022-10-13
申请号:US17849065
申请日:2022-06-24
Applicant: Meta Platforms Technologies, LLC
Inventor: Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty
IPC: G02B6/124 , G02B27/01 , H01J37/305 , H01L21/321 , H01L21/027 , G02B5/18
Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.
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公开(公告)号:US11448806B1
公开(公告)日:2022-09-20
申请号:US17202179
申请日:2021-03-15
Applicant: Meta Platforms Technologies, LLC
Inventor: Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Maxwell Parsons
IPC: G02B5/18 , H01L21/308 , H01L21/306 , F21V8/00 , G02B27/01 , G03F7/00
Abstract: A lithographic patterning of a resist is performed to create a mandrel over a substrate. A deposition of one or more functional materials on the mandrel is performed. And each functional material has a respective refractive index. A selective removal of the mandrel is performed to create a plurality of grating elements formed from the one or more functional materials. The plurality of grating elements are self-aligned and form a diffraction grating. Each grating element may have a heterogenous refractive index (e.g., substantial normal to and/or parallel to a surface of the substrate). The diffraction grating may be used in a near-eye display.
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公开(公告)号:US11579364B2
公开(公告)日:2023-02-14
申请号:US17849065
申请日:2022-06-24
Applicant: Meta Platforms Technologies, LLC
Inventor: Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty
IPC: G02B6/124 , G02B5/18 , G02B27/01 , H01J37/305 , H01L21/321 , H01L21/027 , G02B6/12 , G02B6/34
Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.
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公开(公告)号:US11455031B1
公开(公告)日:2022-09-27
申请号:US15997473
申请日:2018-06-04
Applicant: Meta Platforms Technologies, LLC
Inventor: Robin Sharma , Andrew John Ouderkirk , Matthew E. Colburn , Qi Zhang , Giuseppe Calafiore , John Goward , Karol Constantine Hatzilias , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty , Selso Luanava
Abstract: Disclosed herein are techniques for eye illumination for eye position tracking. An illuminator for eye tracking includes a substrate configured to be placed in front of an eye of a user and a light source positioned on a surface of the substrate. The light source is configured to be positioned within a field of view of the eye of the user. A maximum dimension of the light source in a plane parallel to an emission surface of the light source is less than 500 μm.
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