专利检索 ap:("MITSUBISHI CHEMICAL CORPORATION") AND inv:"Kanako MINAYOSHI" 第 1 页

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发明公开
CLEANING LIQUID FOR REMOVING CERIUM COMPOUND, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER 审中-公开

公开(公告)号：US20240294854A1

公开(公告)日：2024-09-05

申请号：US18659733

申请日：2024-05-09

申请人： MITSUBISHI CHEMICAL CORPORATION

发明人： Kenichi KIYONO , Tomohiro KUSANO , Kan TAKESHITA , Mari ABE , Kanako MINAYOSHI

IPC分类号： C11D7/26 , C11D7/08 , H01L21/02 , H01L21/3105

CPC分类号： C11D7/261 , C11D7/08 , H01L21/02065 , H01L21/31053

摘要： A cleaning liquid for removing a cerium compound contains (A) a six-membered ring compound having two or more hydroxy groups, and (B) an inorganic acid compound, and a mass ratio of the component (B) to the component (A) is 0.05 to 0.6. The component (A) may contain at least one selected from the group consisting of catechol, resorcinol, hydroquinone, pyrogallol, and methylcatechol.