公开(公告)号：US20170178879A1

公开(公告)日：2017-06-22

申请号：US15452896

申请日：2017-03-08

Applicant: MKS Instruments, Inc.

Inventor： Jesse N. KLEIN ,  David C. HALSTEAD ,  Michael R. GILBERT

IPC: H01J37/34 ,  C23C14/54 ,  H01J37/32

CPC classification number: H01J37/3476 ,  C23C14/54 ,  H01J37/32027 ,  H01J37/32055 ,  H01J37/32935 ,  H01J37/32944 ,  H01J37/34 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.