公开(公告)号：US20190177556A9

公开(公告)日：2019-06-13

申请号：US15545208

申请日：2016-01-20

Applicant: MacDermid Enthone Inc.

Inventor： Christian Rietmann ,  Andreas Glöckner

IPC: C09D5/44 ,  H05K3/42 ,  C25D5/56 ,  C25D3/38 ,  C25D5/02

Abstract: The invention relates to a composition and a process for the deposition of conductive polymers on dielectric substrates. In particular, the invention relates to a composition for the formation of electrically conductive polymers on the surface of a dielectric substrate, the composition comprising at least one polymerizable monomer which is capable to form a conductive polymer, an emulsifier and an acid, characterized in that the composition comprises at least one metal-ion selected from the group consisting of lithium-ions, sodium-ions, aluminum-ions, beryllium-ions, bismuth-ions, boron-ions, indium-ions and alkyl imidazolium-ions. The acid is typically a high molecular weight polymeric acid having molecular weight of at least 500,000 Da including, for example, polystyrene sulfonic acid having a molecular weight of approximately 1,000,000 Da.

公开(公告)号：US10508207B2

公开(公告)日：2019-12-17

申请号：US15545208

申请日：2016-01-20

Applicant: MacDermid Enthone Inc.

Inventor： Christian Rietmann ,  Andreas Glöckner

IPC: C09D5/44 ,  C25D5/56 ,  H05K3/42 ,  C25D3/38 ,  C25D5/02

Abstract: The invention relates to a composition and a process for the deposition of conductive polymers on dielectric substrates. In particular, the invention relates to a composition for the formation of electrically conductive polymers on the surface of a dielectric substrate, the composition comprising at least one polymerizable monomer which is capable to form a conductive polymer, an emulsifier and an acid, characterized in that the composition comprises at least one metal-ion selected from the group consisting of lithium-ions, sodium-ions, aluminum-ions, beryllium-ions, bismuth-ions, boron-ions, indium-ions and alkyl imidazolium-ions. The acid is typically a high molecular weight polymeric acid having molecular weight of at least 500,000 Da including, for example, polystyrene sulfonic acid having a molecular weight of approximately 1,000,000 Da.

公开(公告)号：US20180002541A1

公开(公告)日：2018-01-04

申请号：US15545208

申请日：2016-01-20

Applicant: MacDermid Enthone Inc.

Inventor： Christian Rietmann ,  Andreas Glöckner

IPC: C09D5/44 ,  H05K3/42 ,  C25D5/56 ,  C25D5/02 ,  C25D3/38

Abstract: The invention relates to a composition and a process for the deposition of conductive polymers on dielectric substrates. In particular, the invention relates to a composition for the formation of electrically conductive polymers on the surface of a dielectric substrate, the composition comprising at least one polymerizable monomer which is capable to form a conductive polymer, an emulsifier and an acid, characterized in that the composition comprises at least one metal-ion selected from the group consisting of lithium-ions, sodium-ions, aluminum-ions, beryllium-ions, bismuth-ions, boron-ions, indium-ions and alkyl imidazolium-ions. The acid is typically a high molecular weight polymeric acid having molecular weight of at least 500,000 Da including, for example, polystyrene sulfonic acid having a molecular weight of approximately 1,000,000 Da.