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公开(公告)号：US09257710B2
公开(公告)日：2016-02-09
申请号：US13350688
申请日：2012-01-13
CPC分类号： H01M8/188 , H01M4/8853 , H01M8/04201 , H01M8/04223 , H01M8/04225 , H01M8/20 , Y02E60/528
摘要： A start-up plating process for a flow cell battery is disclosed. Upon start-up of the flow-cell stack, catalysts may have deplated from the electrodes. The catalyst is replated to the electrode by application of currents to the stack prior to circulating electrolyte fluids.
摘要翻译： 公开了流动池电池的启动电镀工艺。 在启动流通池堆时，催化剂可能从电极中脱落。 在循环电解质流体之前，通过向电池堆施加电流将催化剂转移到电极。
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2.发明授权Polishing apparatus and substrate retainer ring providing continuous slurry distribution 失效抛光装置和基板保持环提供连续的浆料分布公开(公告)号：US06447380B1
公开(公告)日：2002-09-10
申请号：US09607896
申请日：2000-06-30
申请人： Xuyen Pham , Joe Simon
发明人： Xuyen Pham , Joe Simon
IPC分类号： B24B3704
CPC分类号： B24B37/32
摘要： A polishing apparatus includes a rotatable head assembly including a substrate retainer that incorporates a cavity in the face surface of the substrate retainer for temporarily holding polishing slurry during operation of the polishing apparatus. The cavity resides in the face surface of the substrate retainer at a location adjacent the perimeter surface of the retainer. During operation of the polishing apparatus, slurry flowing along the surface of the polishing pad flows into the cavity where a portion of the slurry is temporarily held. As the head assembly of the polishing apparatus rotates against the polishing pad, slurry continuously flows from the cavity across the polishing pad and is uniformly distributed across the exposed surface of the substrate being polished. An offset in the cavity wall permits used slurry to flow away from the substrate retainer during rotation of the head assembly.
摘要翻译： 抛光装置包括可旋转的头部组件，其包括基板保持器，该基板保持器在基板保持器的表面中并入腔体，用于在抛光装置的操作期间临时保持抛光浆料。 空腔位于与保持器的周边表面相邻的位置处的基板保持器的表面。 在抛光装置的操作期间，沿着抛光垫的表面流动的浆料流入其中浆料的一部分暂时保持的空腔。 当抛光装置的头部组件相对于抛光垫旋转时，浆料从腔体连续地流过抛光垫，并且均匀分布在被抛光的基底的暴露表面上。 空腔壁中的偏移允许使用的浆料在头部组件旋转期间从衬底保持器流出。
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