公开(公告)号：US20080265174A1

公开(公告)日：2008-10-30

申请号：US12103321

申请日：2008-04-15

申请人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

发明人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

IPC分类号： H01J3/26

CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0209 ,  H01J2237/3045 ,  H01J2237/30461

摘要： A charged particle beam writing apparatus includes an unit configured to irradiate a beam, a deflector configured to deflect the beam, a stage, on which a target is placed, configured to perform moving continuously, an lens configured to focus the beam onto the target, an unit configured to calculate a correction amount for correcting positional displacement of the beam on a surface of the target resulting from a first magnetic field caused by the lens and a second magnetic field caused by an eddy current generated by the first magnetic field and the moving of the stage, an unit configured to calculate a correction position where the positional displacement on the surface of the target has been corrected using the correction amount, and an unit configured to control the deflector so that the beam may be deflected onto the correction position.

摘要翻译： 带电粒子束写入装置包括被配置为照射光束的单元，被配置为使光束偏转的偏转器，配置有目标的台阶，其被配置为连续地进行移动;配置成将光束聚焦到目标上的透镜， 被配置为计算校正量，用于校正由由透镜引起的第一磁场产生的目标表面上的光束的位置偏移和由由第一磁场和移动的所产生的涡流引起的第二磁场 所述单元被配置为使用所述校正量来计算已经校正了所述目标的表面上的位置偏移的校正位置，以及被配置为控制所述偏转器使得所述光束可能偏转到所述校正位置的单元。

公开(公告)号：US20080011963A1

公开(公告)日：2008-01-17

申请号：US11774823

申请日：2007-07-09

申请人： Makoto HIRAMOTO

发明人： Makoto HIRAMOTO

IPC分类号： G21K5/00

CPC分类号： H01J37/265 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/263 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/221 ,  H01J2237/2823 ,  H01J2237/30483

摘要： A charged particle beam apparatus in accordance with one preferred form of this invention includes an irradiation unit for irradiating a charged particle beam, an instrumentation unit which performs instrumentation of a reflection signal from a mark as obtained by scanning the mark while irradiating the charged particle beam onto the mark, and a measurement unit which uses an approximation equation defined by use of a prespecified mark shape function and an error function to perform the fitting of a waveform obtained based on the reflection signal and which measures beam resolution which becomes a parameter of the error function from the waveform obtained based on the reflection signal.

摘要翻译： 根据本发明的一个优选形式的带电粒子束装置包括用于照射带电粒子束的照射单元，仪器单元，其从照射带电粒子束的扫描标记获得的标记进行反射信号的检测 以及测量单元，其使用通过使用预先指定的标记形状函数和误差函数定义的近似方程来执行基于反射信号获得的波形的拟合，并且测量作为参数的波束分辨率 基于反射信号获得的波形的误差函数。