公开(公告)号：US07643137B2

公开(公告)日：2010-01-05

申请号：US11243425

申请日：2005-10-05

申请人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

发明人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

IPC分类号： G01N21/00

CPC分类号： G01N21/95692

摘要： A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

摘要翻译： 用于检查作为待检查对象的基板的缺陷的缺陷检查装置包括用于照射基板的照明光学系统，用于从基板接收衍射光的接收光学系统和设置在照明光学器件中的任一个中的偏振元件 系统或接收光学系统。

公开(公告)号：US20060232769A1

公开(公告)日：2006-10-19

申请号：US11243425

申请日：2005-10-05

申请人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

发明人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

IPC分类号： G01N21/88

CPC分类号： G01N21/95692

摘要： A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

公开(公告)号：US08446578B2

公开(公告)日：2013-05-21

申请号：US12591298

申请日：2009-11-16

申请人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

发明人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

IPC分类号： G01N21/94

CPC分类号： G01N21/95692

摘要： A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

摘要翻译： 用于检查作为待检查对象的基板的缺陷的缺陷检查装置包括用于照射基板的照明光学系统，用于从基板接收衍射光的接收光学系统和设置在照明光学器件中的任一个中的偏振元件 系统或接收光学系统。

公开(公告)号：US20100103419A1

公开(公告)日：2010-04-29

申请号：US12591298

申请日：2009-11-16

申请人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

发明人： Mari Sugihara ,  Takeo Oomori ,  Kazuhiko Fukazawa

IPC分类号： G01N21/88 ,  G01J4/00

CPC分类号： G01N21/95692

摘要： A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

公开(公告)号：US20060192953A1

公开(公告)日：2006-08-31

申请号：US11410944

申请日：2006-04-26

申请人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01B11/30 ,  G01N21/21 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

公开(公告)号：US06654113B2

公开(公告)日：2003-11-25

申请号：US09950074

申请日：2001-09-12

申请人： Kazuhiko Fukazawa ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Takeo Oomori

IPC分类号： G01N2188

CPC分类号： G01N21/956 ,  G01N21/9501 ,  G01N2021/9513

摘要： The surface inspection apparatus according to the present invention obtains images of a test piece by capturing images of the test piece with an image-capturing device while varying at least one apparatus condition (e.g., the wafer tilt angle) through apparatus condition adjustment and determines an optimal setting at which a surface inspection is to be conducted on the test piece based upon the images thus obtained. As a result, the optimal setting for the inspection can be accurately ascertained with ease even when the pitch of a pattern formed at the surface of the test piece is not known, thereby making it possible to perform a surface inspection while sustaining high levels of accuracy and efficiency at all times.

公开(公告)号：US20080316475A1

公开(公告)日：2008-12-25

申请号：US12222500

申请日：2008-08-11

申请人： Kazuhiko Fukazawa ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Takeo Oomori

IPC分类号： G01N21/88

CPC分类号： G01N21/956

摘要： An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.

摘要翻译： 用于缺陷检查的装置和方法能够可靠地减少来自下层的噪声光的量和良好的缺陷检查。 该装置包括照明装置，照明装置照射包括具有形成在上层上的循环图案的抗蚀剂层的被检查基板，以及形成根据光检查的基板的图像的光学图像形成系统 从通过照射光的照射检查的基板出现。 照明光的波长被设定为使得从被检查的基板出射的光中的来自抗蚀剂层的表面的光的强度大于通过循环图案层的表面的光的强度 形成在抗蚀剂层下面。

公开(公告)号：US07298471B2

公开(公告)日：2007-11-20

申请号：US11410944

申请日：2006-04-26

申请人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Koichiro Komatsu ,  Takeo Oomori

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01B11/30 ,  G01N21/21 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

摘要翻译： 表面检查装置和表面检查方法旨在可靠地处理更精细的重复间距而不缩短照明光的波长。 为此，该装置包括以线性偏振光照射形成在要检查的基板表面上的重复图案的单元，该单元设置为倾斜角度，该倾斜角度与第一振动平面的相交线的方向之间的角度 基板表面上的线偏振光和重复图案的重复方向，从垂直于线偏振光的振动平面的偏振光分量中提取出的光从具有重复图案的光中发出的光 镜面方向，以及根据偏振光分量的光强度检测重复图案的缺陷的单元。

公开(公告)号：US20060238754A1

公开(公告)日：2006-10-26

申请号：US11473107

申请日：2006-06-23

申请人： Kazuhiko Fukazawa ,  Takeo Oomori

发明人： Kazuhiko Fukazawa ,  Takeo Oomori

IPC分类号： G01N21/88

CPC分类号： G01N21/956

摘要： An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.

公开(公告)号：US20060098189A1

公开(公告)日：2006-05-11

申请号：US11263982

申请日：2005-11-02

申请人： Takeo Oomori ,  Kazuhiko Fukazawa ,  Yuwa Ishii

发明人： Takeo Oomori ,  Kazuhiko Fukazawa ,  Yuwa Ishii

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/21 ,  G01N2021/9513

摘要： A surface inspection apparatus includes an illumination means for illuminating a pattern formed through a predetermined pattern forming process containing a process of exposure of a resist layer formed on a substrate having a periodicity with a linearly polarized light, a setting means for setting a direction of the substrate such that a plane of vibration of the linear polarization and a direction of repetition of the pattern are obliquely to each other, an extraction means for extracting a polarization component having a plane of vibration perpendicular to that of the linear polarization out of specularly reflected light from the pattern, and an image forming means for forming an image of the surface of the substrate based on the extracted light. A pattern forming condition in the pattern forming process is specified based on the light intensity of the image of the surface of the substrate formed by the image forming means.

摘要翻译： 表面检查装置包括照明装置，用于照亮通过包含形成在具有线性偏振光的周期的基板上的抗蚀剂层的曝光过程的预定图案形成处理形成的图案;设定装置， 基板，使得线偏振的振动平面和图案的重复方向彼此倾斜;提取装置，用于从镜面反射光中提取具有与线偏振的平面垂直的振动平面的偏振分量 以及用于基于所提取的光形成基板的表面的图像的图像形成装置。 基于由图像形成装置形成的基板的表面的图像的光强度来指定图案形成处理中的图案形成条件。