公开(公告)号：US20050060058A1

公开(公告)日：2005-03-17

申请号：US10850629

申请日：2004-05-20

申请人： Marion Cameron ,  Ioan Carabenciov ,  William Collins ,  William Davis ,  Brian Goldberg ,  Mohan Rao ,  Anastasios Tsonis ,  Craig West

发明人： Marion Cameron ,  Ioan Carabenciov ,  William Collins ,  William Davis ,  Brian Goldberg ,  Mohan Rao ,  Anastasios Tsonis ,  Craig West

IPC分类号： D05B19/08 ,  D05C5/00 ,  G06F19/00 ,  D05C5/02

CPC分类号： D05B19/08 ,  D05C5/00

摘要： A method and system of remotely communicating embroidery pattern data to embroidery machines involving providing an embroidery pattern in response to a pattern selection input from a remote user at a local node, the input communicated through a communications connection between the local node and a server, receiving an identification address for an embroidery machine, communicating the embroidery pattern to the embroidery machine for application of the embroidery pattern to a work piece. The system includes a server having circuitry for receiving wireless electronic communications, a local node having a graphical user interface for receiving input from a remote user, the local node in wireless electronic communication with the server, a database of electronically encoded data, the data comprising embroidery patterns, the database in communication with the server, and responsive to the local node input, to retrieve embroidery patterns and to display the embroidery patterns through the server to the remote user, and an embroidery machine in communication with the server, the embroidery machine receiving embroidery patterns from the database through the server.

摘要翻译： 一种将刺绣图案数据远程传送到刺绣机的方法和系统，所述绣花机响应于在本地节点处的来自远程用户的模式选择输入而提供刺绣图案，所述输入通过本地节点和服务器之间的通信连接进行通信， 刺绣机的识别地址，将刺绣图案与刺绣机通信，以将刺绣图案应用于工件。 该系统包括具有用于接收无线电子通信的电路的服务器，具有用于从远程用户接收输入的图形用户界面的本地节点，与服务器进行无线电子通信的本地节点，电子编码数据的数据库，该数据包括 刺绣图案，与服务器通信的数据库，并响应于本地节点输入，检索绣花图案，并通过服务器将刺绣图案显示给远程用户，以及与服务器通信的刺绣机，刺绣机 通过服务器从数据库接收刺绣图案。

公开(公告)号：US20070178665A1

公开(公告)日：2007-08-02

申请号：US11626979

申请日：2007-01-25

申请人： Craig West

发明人： Craig West

IPC分类号： H01L21/76

CPC分类号： G03F7/70466 ,  G03F1/84 ,  G03F7/70433 ,  G03F7/70658 ,  H01L22/14 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of forming integrated circuit components is provided. A photomask is provided that includes a first mask feature having a mask feature geometry corresponding to a first type of integrated circuit (IC) component. A first lithography process is performed to transfer the first mask feature geometry to a semiconductor wafer to form a first IC component on the semiconductor wafer. At least one electrical characteristic of the first IC component on the semiconductor wafer is measured. The first mask feature geometry is physically modified based at least on the results of measuring the at least one electrical characteristic of the first IC component.

摘要翻译： 提供一种形成集成电路部件的方法。 提供了一种光掩模，其包括具有对应于第一类型集成电路（IC）部件的掩模特征几何形状的第一掩模特征。 执行第一光刻处理以将第一掩模特征几何形状转移到半导体晶片，以在半导体晶片上形成第一IC部件。 测量半导体晶片上的第一IC部件的至少一个电特性。 至少基于测量第一IC部件的至少一个电特性的结果，物理地修改第一掩模特征几何形状。