公开(公告)号：US20050264786A1

公开(公告)日：2005-12-01

申请号：US11101235

申请日：2005-04-07

申请人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G02B7/02 ,  G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

公开(公告)号：US20050134967A1

公开(公告)日：2005-06-23

申请号：US10906737

申请日：2005-03-03

申请人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G02B7/02 ,  G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00 ,  G02B9/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

摘要翻译： 用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。 后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。 曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。 靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。