公开(公告)号：US06258283B1

公开(公告)日：2001-07-10

申请号：US09193425

申请日：1998-11-17

申请人： Masaaki Mikami ,  Takashi Ito ,  Takamitsu Orimoto ,  Mitsumasa Okada

发明人： Masaaki Mikami ,  Takashi Ito ,  Takamitsu Orimoto ,  Mitsumasa Okada

IPC分类号： B44C122

CPC分类号： B82Y25/00 ,  G01R33/093 ,  G11B5/3116 ,  G11B5/3903 ,  G11B5/3932 ,  H01L43/12 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T428/1143

摘要： The method of making the magnetic resistance element comprises the steps of: forming a first magnetizable layer, a non-magnetizable layer and a second magnetizable layer, in this order, on an insulating layer; providing a resist layer for forming a main part of the magnetic resistance element on the second magnetizable layer; etching side faces of the first magnetizable layer, the non-magnetizable layer and the second magnetizable layer to form into slope faces by ion milling from the second magnetizable layer side; forming terminals on the slope faces; and removing the resist layer, wherein a part of the first magnetizable layer which is located outside of the slope faces is left on the insulating layer when the side faces of the first magnetizable layer, the non-magnetizable layer and the second magnetizable layer are etched by ion milling.

摘要翻译： 制造磁阻元件的方法包括以下步骤：在绝缘层上依次形成第一可磁化层，不可磁化层和第二可磁化层; 提供用于在所述第二可磁化层上形成所述磁阻元件的主要部分的抗蚀剂层; 蚀刻第一可磁化层，不可磁化层和第二可磁化层的侧面，以从第二可磁化层侧离子铣削形成倾斜面; 在坡面上形成端子; 以及去除所述抗蚀剂层，其中当所述第一可磁化层，所述不可磁化层和所述第二可磁化层的侧面被蚀刻时，位于所述倾斜面外侧的所述第一可磁化层的一部分留在所述绝缘层上 通过离子研磨。

公开(公告)号：US06475649B2

公开(公告)日：2002-11-05

申请号：US09769239

申请日：2001-01-24

申请人： Masaaki Mikami ,  Takashi Ito ,  Takamitsu Orimoto ,  Mitsumasa Okada

发明人： Masaaki Mikami ,  Takashi Ito ,  Takamitsu Orimoto ,  Mitsumasa Okada

IPC分类号： G11B5127

CPC分类号： B82Y25/00 ,  G01R33/093 ,  G11B5/3116 ,  G11B5/3903 ,  G11B5/3932 ,  H01L43/12 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T428/1143

摘要： The method of making the magnetic resistance element comprises the steps of: forming a first magnetizable layer, a non-magnetizable layer and a second magnetizable layer, in this order, on an insulating layer; providing a resist layer for forming a main part of the magnetic resistance element on the second magnetizable layer; etching side faces of the first magnetizable layer, the non-magnetizable layer and the second magnetizable layer to form into slope faces by ion milling from the second magnetizable layer side; forming terminals on the slope faces; and removing the resist layer, wherein a part of the first magnetizable layer which is located outside of the slope faces is left on the insulating layer when the side faces of the first magnetizable layer, the non-magnetizable layer and the second magnetizable layer are etched by ion milling.

摘要翻译： 制造磁阻元件的方法包括以下步骤：在绝缘层上依次形成第一可磁化层，不可磁化层和第二可磁化层; 提供用于在所述第二可磁化层上形成所述磁阻元件的主要部分的抗蚀剂层; 蚀刻第一可磁化层，不可磁化层和第二可磁化层的侧面，以从第二可磁化层侧离子铣削形成倾斜面; 在坡面上形成端子; 以及去除所述抗蚀剂层，其中当所述第一可磁化层，所述不可磁化层和所述第二可磁化层的侧面被蚀刻时，位于所述倾斜面外侧的所述第一可磁化层的一部分留在所述绝缘层上 通过离子研磨。

公开(公告)号：US5917681A

公开(公告)日：1999-06-29

申请号：US684421

申请日：1996-07-19

申请人： Mithumasa Okada ,  Takamitsu Orimoto ,  Keita Ohtsuka

发明人： Mithumasa Okada ,  Takamitsu Orimoto ,  Keita Ohtsuka

IPC分类号： G11B5/31 ,  G11B5/39 ,  G11B5/40 ,  G11B5/455 ,  G11B5/33

CPC分类号： G11B5/3906 ,  G11B5/3967 ,  G11B5/3133 ,  G11B5/3163 ,  G11B5/3166 ,  G11B5/40 ,  G11B5/455 ,  Y10T428/254 ,  Y10T428/256

摘要： According to a method of manufacturing a thin film magnetic head, a magnetoresistive device and an alumina layer are formed on a substrate, then the alumina layer is covered with a covering layer made of metal such as Ti having a thickness of more than 10 nm, then a photoresist film is formed on the covering layer, and then an opening is formed by exposing and developing the photoresist film. In turn, a magnetic metal film is formed on an allover surface, then the photoresist film and the magnetic metal film thereon are removed. The thin film magnetic head structured as above may provide a good magnetic characteristic since it has the covering layer on the alumina layer to prevent the alumina layer from being corroded by liquid developer. In addition, a magnetic recording unit employing the thin film magnetic head may reproduce data recorded with high density.

摘要翻译： 根据制造薄膜磁头的方法，在基板上形成磁阻装置和氧化铝层，然后用厚度大于10nm的Ti等金属制的覆盖层覆盖氧化铝层， 然后在覆盖层上形成光致抗蚀剂膜，然后通过曝光和显影光致抗蚀剂膜形成开口。 反过来，在整个表面上形成磁性金属膜，然后除去其上的光致抗蚀剂膜和磁性金属膜。 由上述构成的薄膜磁头可以提供良好的磁特性，因为它具有在氧化铝层上的覆盖层，以防止氧化铝层被液体显影剂腐蚀。 此外，采用薄膜磁头的磁记录单元可以再现以高密度记录的数据。

公开(公告)号：US20080038849A1

公开(公告)日：2008-02-14

申请号：US11647166

申请日：2006-12-29

申请人： Takamitsu Orimoto ,  Ryuei Ono

发明人： Takamitsu Orimoto ,  Ryuei Ono

IPC分类号： H01L21/66

CPC分类号： H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： An evaluation method includes the steps of forming a dummy pattern having a patterned part with the same critical dimension as a minimum critical dimension of an actual device having a fine pattern that is so fine that a probe for a continuity test cannot be connected to both ends of the fine pattern, in forming the fine pattern, while connecting both ends of the dummy pattern to a pair of pads to which the probe is connectible, performing the continuity test of the dummy pattern using the probe and the pads, and evaluating an insulating characteristic of the fine pattern based on a result of the continuity test.

摘要翻译： 一种评估方法包括以下步骤：形成具有图案部分的虚拟图案，所述图案部分具有与具有精细图案的实际装置的最小临界尺寸相同的临界尺寸，使得用于连续性测试的探针不能连接到两端 在精细图案的形成中，在将伪图案的两端连接到探针可连接的一对焊盘的同时，使用探针和焊盘进行虚设图案的连续性测试，并评估绝缘体 基于连续性测试结果的精细图案的特征。