公开(公告)号：US20100108154A1

公开(公告)日：2010-05-06

申请号：US12610019

申请日：2009-10-30

申请人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

发明人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

IPC分类号： G05D11/08

CPC分类号： G05D11/132 ,  Y10T137/0396 ,  Y10T137/2499 ,  Y10T137/2509 ,  Y10T137/2708

摘要： A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

摘要翻译： 一种材料气体浓度控制系统，用于保持包含罐的混合气体中的材料气体的浓度恒定以容纳材料，输入用于将所容纳的材料蒸发到罐中的载气的输入管线和输出的出口管线 所述混合气体由在所述罐中的所述原料气体和所述载气组成，还包括配置在所述入口管路中的第一阀，测量所述混合气体中的原料气体的浓度的浓度测定部，以及浓度控制 控制第一阀的开度的部分，使得由浓度测量部测量的材料气体的测量浓度变为预先确定的设定浓度。

公开(公告)号：US08459290B2

公开(公告)日：2013-06-11

申请号：US12610019

申请日：2009-10-30

申请人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

发明人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

IPC分类号： B05C11/00

CPC分类号： G05D11/132 ,  Y10T137/0396 ,  Y10T137/2499 ,  Y10T137/2509 ,  Y10T137/2708

摘要： A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

摘要翻译： 一种材料气体浓度控制系统，用于保持包含罐的混合气体中的材料气体的浓度恒定以容纳材料，输入用于将所容纳的材料蒸发到罐中的载气的输入管线和输出的出口管线 所述混合气体由在所述罐中的所述原料气体和所述载气组成，还包括配置在所述入口管路中的第一阀，测量所述混合气体中的原料气体的浓度的浓度测定部， 控制第一阀的开度的部分，使得由浓度测量部测量的材料气体的测量浓度变为预先确定的设定浓度。

公开(公告)号：US07604010B2

公开(公告)日：2009-10-20

申请号：US11209741

申请日：2005-08-24

申请人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

发明人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

IPC分类号： H01L21/00

CPC分类号： C23C16/4405 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.

摘要翻译： 用于半导体工艺的成膜装置包括清洁气体供应电路，浓度测量部分和信息处理器。 清洗气体供给回路构成为向反应室供给清洗气体，进行从反应室的内表面除去来自成膜气体的副产物膜的清洗。 集中测定部设置在排气系统中，以监测来自反应室的废气中所含有的预定成分的浓度。 信息处理器被配置为将由浓度测量部获得的测量值与预设值进行比较，从而确定清洁的终点。

公开(公告)号：US20060042544A1

公开(公告)日：2006-03-02

申请号：US11209741

申请日：2005-08-24

申请人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

发明人： Kazuhide Hasebe ,  Nobutake Nodera ,  Atsushi Endo ,  Makoto Umeki ,  Katsumi Nishimura ,  Masakazu Minami ,  Makoto Yoshida

IPC分类号： B08B3/12 ,  C23C16/00

CPC分类号： C23C16/4405 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.

公开(公告)号：US08800589B2

公开(公告)日：2014-08-12

申请号：US12609965

申请日：2009-10-30

申请人： Masakazu Minami ,  Masaki Inoue

发明人： Masakazu Minami ,  Masaki Inoue

IPC分类号： C23C16/448 ,  G05D11/13 ,  C30B25/14

CPC分类号： G05D11/139 ,  C23C16/4482 ,  C30B25/14 ,  Y10T137/2499 ,  Y10T137/2509

摘要： An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body.

摘要翻译： 本发明的目的是提供一种响应性材料气体浓度控制系统，其可以安装在鼓泡系统上，并且即使材料气体的分压也可以将混合气体中的原料气体的浓度控制在恒定值 波动 材料气体浓度控制系统用于材料蒸发系统，并且包括连接到出口管线并具有用于使混合气体流动的内部流动通道的主体，测量材料气体浓度的浓度测量部件 在所述混合气体中配置有第一阀，所述第一阀配置在所述浓度测定部的下游，并且以预先设定的浓度调整由所述浓度测定部测定的测定浓度，其中，所述浓度测定部和所述第一阀安装在 身体。

公开(公告)号：US20110155264A1

公开(公告)日：2011-06-30

申请号：US12976754

申请日：2010-12-22

申请人： Masakazu Minami ,  Masaki Inoue

发明人： Masakazu Minami ,  Masaki Inoue

IPC分类号： F16K17/00

CPC分类号： G05D11/138 ,  Y10T137/0396 ,  Y10T137/2509 ,  Y10T137/2708 ,  Y10T137/7736

摘要： To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller.

摘要翻译： 为了防止在控制阀的可移动范围内的源气体的压力的控制的丧失，提供了源气体浓度控制系统。 该系统可以包括设置在出口管路上的第一阀，测量混合气体中的源气体浓度的浓度测量部件和控制第一阀门的行程的浓度控制部件， 源气体变得等于预定浓度设定。 测量浓度可以在浓度测量部分测量。 该系统还可以包括温度控制器，其控制罐内的温度以满足温度设定;以及温度设定部分，其设定温度控制器的温度设置。

公开(公告)号：US08459291B2

公开(公告)日：2013-06-11

申请号：US12976754

申请日：2010-12-22

申请人： Masakazu Minami ,  Masaki Inoue

发明人： Masakazu Minami ,  Masaki Inoue

IPC分类号： B05C11/00

CPC分类号： G05D11/138 ,  Y10T137/0396 ,  Y10T137/2509 ,  Y10T137/2708 ,  Y10T137/7736

摘要： To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller.

摘要翻译： 为了防止在控制阀的可移动范围内的源气体的压力的控制的丧失，提供了源气体浓度控制系统。 该系统可以包括设置在出口管路上的第一阀，测量混合气体中的源气体浓度的浓度测量部件和控制第一阀门的行程的浓度控制部件， 源气体变得等于预定浓度设定。 测量浓度可以在浓度测量部分测量。 该系统还可以包括温度控制器，其控制罐内的温度以满足温度设定;以及温度设定部分，其设定温度控制器的温度设置。

公开(公告)号：US20100108153A1

公开(公告)日：2010-05-06

申请号：US12609965

申请日：2009-10-30

申请人： Masakazu Minami ,  Masaki Inoue

发明人： Masakazu Minami ,  Masaki Inoue

IPC分类号： G05D11/00

CPC分类号： G05D11/139 ,  C23C16/4482 ,  C30B25/14 ,  Y10T137/2499 ,  Y10T137/2509

摘要： An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body.

摘要翻译： 本发明的目的是提供一种响应性材料气体浓度控制系统，其可以安装在鼓泡系统上，并且即使材料气体的分压也可以将混合气体中的原料气体的浓度控制在恒定值 波动 材料气体浓度控制系统用于材料蒸发系统，并且包括连接到出口管线并具有用于使混合气体流动的内部流动通道的主体，测量材料气体浓度的浓度测量部件 在所述混合气体中配置有第一阀，所述第一阀配置在所述浓度测定部的下游，并且以预先设定的浓度调整由所述浓度测定部测定的测定浓度，其中，所述浓度测定部和所述第一阀安装在 身体。